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Inventor

Hiroshi Toyama

Inventor
Nagano, JP

Overview

45→
Patents
2000–2020
Patent span
Physics
Primary field (CPC G)

Patents· 45 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H01Jprimary
H01JElectric discharge tubes or discharge lamps13%
G01NInvestigating or analysing materials by determining their chemical or physical properties12%
G03GElectrography12%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices9%
G06TImage data processing or generation, in general8%
H04NPictorial communication, e.g. television7%
B41JTypewriters6%
G02FOptical devices or arrangements for the control of light by modification of the optical properties of the media of the elements involved therein6%
G06KGraphical data reading4%
G02BOptical elements, systems or apparatus3%
PatentTitleYear
10,847,482Integrated circuit structures and methods of forming an opening in a material202010,651,100Substrates, structures within a scribe-line area of a substrate, and methods of forming a conductive line of a redistribution layer of a substrate and of forming a structure within a scribe-line area of the substrate202010,525,738Transporting medium through drying unit during printing interruption202010,271,782Liquid collecting apparatus and liquid collecting method201910,093,116Printing apparatus and printing method20189,831,671Power supply device20179,627,999'Power supply device'20179,475,315'Liquid discharge apparatus'20168,816,712'Inspection device'20148,604,430'Method and an apparatus of an inspection system using an electron beam'20138,451,197'Information display apparatus having a plurality of thin-film light-emitting diodes'20138,421,710'Light source apparatus and head-up display apparatus incorporating the light source apparatus'20138,178,840'Specimen inspection equipment and how to make the electron beam absorbed current images'20128,134,125'Method and apparatus of an inspection system using an electron beam'20128,120,634'Image forming apparatus, image forming method and data control device'20128,023,847'Image forming apparatus and image forming method'20118,023,070'LED backlight device and LCD device'20118,013,952'LED backlight device and LCD device'20117,944,463'Light scanning apparatus, image forming apparatus equipped with such light scanning apparatus, and control method or image forming method for such image forming apparatus'20117,920,156'Image forming apparatus, image forming method and data control device'20117,884,371'LED backlight device and LCD device'20117,884,374'LED backlight device and LCD device'20117,863,614'LED backlight device and LCD device'20117,834,897'Optical scanning apparatus, control method of such apparatus, and image forming apparatus'20107,815,276'Image forming method and apparatus'20107,663,104'Specimen inspection equipment and how to make electron beam absorbed current images'20107,626,606'Light scanning apparatus, image forming apparatus equipped with such light scanning apparatus, and control method or image forming method for such image forming apparatus'20097,508,407'Light scanning apparatus, image forming apparatus equipped with such light scanning apparatus, and control method or image forming method for such image forming apparatus'20097,439,506'Method and an apparatus of an inspection system using an electron beam'20087,405,743'Image forming method and apparatus'20087,358,019'Developing process and image forming process'20087,232,996'Method and an apparatus of an inspection system using an electron beam'20077,083,097'Optical information reading apparatus'20067,058,326'Color image forming apparatus'20067,041,423'Developing method and image forming method'20067,031,646'Developing device'20067,012,252'Method and an apparatus of an inspection system using an electron beam'20066,987,265'Method and an apparatus of an inspection system using an electron beam'20066,888,138'Absorption current image apparatus in electron microscope'20056,838,219'Toner and image forming apparatus using the same'20056,730,449'Toner and image forming apparatus using the same'20046,512,227'Method and apparatus for inspecting patterns of a semiconductor device with an electron beam'20036,452,178'Method and an apparatus of an inspection system using an electron beam'20026,348,690'Method and an apparatus of an inspection system using an electron beam'20026,104,734'Solid state laser apparatus'2000

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2000–2013Patents assigned to HITACHI LTD (10)· patent assignee history
2000–2014Based in Hachioji, JP· patent location history
2002–2013Based in Hachiouji, JP· patent location history
2004–2020Patents assigned to SEIKO EPSON CORP (18)· patent assignee history
2004–2016Based in Nagano, JP· patent location history
2005–2014Patents assigned to HITACHI HIGH TECH CORP (4)· patent assignee history
2008–2011Based in Suwa, JP· patent location history
2011–2013Patents assigned to OKI DATA KK (7)· patent assignee history
2011–2013Based in Tokyo, JP· patent location history
2012–2019Patents assigned to TOYAMA HIROSHI (8)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
SEIKO EPSON CORP182004–2020
HITACHI LTD102000–2013
TOYAMA HIROSHIself82012–2019
OKI DATA KK72011–2013
HITACHI HIGH TECH CORP42005–2014
Locations
LocationPatentsSpan
Nagano, JP102004–2016
Hachioji, JP92000–2014
Hachiouji, JP82002–2013
Suwa, JP52008–2011
Tokyo, JP42011–2013