Inventor
Kuang-Hui Chang
Inventor
Hsinchu, TW
Overview
Patents· 6 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1025%
G01NInvestigating or analysing materials by determining their chemical or physical properties17%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h1017%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests17%
Y10TTechnical subjects covered by former us classification17%
H01JElectric discharge tubes or discharge lamps8%
PatentTitleYear
6,261,843'Test pattern for monitoring metal corrosion on integrated circuit wafers'20015,874,309'Method for monitoring metal corrosion on integrated circuit wafers'19995,746,928'Process for cleaning an electrostatic chuck of a plasma etching apparatus'19985,672,543'Volcano defect-free tungsten plug'19975,554,563'In situ hot bake treatment that prevents precipitate formation after a contact layer etch back step'19965,554,254'Post contact layer etch back process which prevents precipitate formation'1996Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1996–2001Patents assigned to TAIWAN SEMICONDUCTOR MFG (6)· patent assignee history
1996–2001Based in Hsinchu, TW· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| TAIWAN SEMICONDUCTOR MFG | 6 | 1996–2001 |
Locations
| Location | Patents | Span |
|---|---|---|
| Hsinchu, TW | 6 | 1996–2001 |