Inventor
Chinh Dinh
Inventor
San Jose, CA, US
Overview
Patents· 4 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H01Jprimary
H01JElectric discharge tubes or discharge lamps30%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1030%
H01LSemiconductor devices20%
G01RMeasuring electric variables10%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h1010%
PatentTitleYear
9,601,301'Non-intrusive measurement of a wafer DC self-bias in semiconductor processing equipment'20179,368,370'Temperature ramping using gas distribution plate heat'20168,748,322'Silicon oxide recess etch'20148,148,977'Apparatus for characterizing a magnetic field in a magnetically enhanced substrate processing system'2012Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2012–2017Patents assigned to APPLIED MATERIALS INC (4)· patent assignee history
2012Patents assigned to DINH CHINH (1)· patent assignee history
2012Patents assigned to HANAWA HIROJI (1)· patent assignee history
2012Patents assigned to RAMASWAMY KARTIK (1)· patent assignee history
2012Patents assigned to WONG LAWRENCE (1)· patent assignee history
2012–2017Based in San Jose, CA, US· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| APPLIED MATERIALS INC | 4 | 2012–2017 |
| DINH CHINHself | 1 | 2012 |
| HANAWA HIROJI | 1 | 2012 |
| RAMASWAMY KARTIK | 1 | 2012 |
| WONG LAWRENCE | 1 | 2012 |
Locations
| Location | Patents | Span |
|---|---|---|
| San Jose, California, US | 4 | 2012–2017 |