LexDanaLexDanabeta
Inventor

Takeshi Iwai

Inventor
Kawasaki, JP

Overview

55→
Patents
1999–2016
Patent span
Physics
Primary field (CPC G)

Patents· 55 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices41%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests34%
C08FMacromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds9%
C07DHeterocyclic compounds3%
LOC263%
C07CAcyclic or carbocyclic compounds2%
LOC122%
B01DSeparation1%
B60JWindows, windscreens, non-fixed roofs, doors, or similar devices for vehicles1%
C08JWorking-up1%
PatentTitleYear
9,514,898'Switch device for sunroof'2016D0737736'Radiator grill for automobile'20158,580,481'Resist polymer and resist composition'20138,451,091'Control system, electronic control unit, and communication method'2013D0680248'Rear combination for an automobile'2013D0680249'Rear combination lamp for automobile'2013D0679039'Head lamp for automobile'20138,394,569'Resist composition for immersion lithography and method for forming resist pattern'20138,338,075'Positive resist composition and method of forming resist pattern'20128,293,449'Positive resist composition and method of forming resist pattern'20128,263,307'Positive resist composition and method of forming resist pattern'20128,198,004'Resist composition'20128,092,979'Resist polymer and resist composition'20128,021,824'Polymer compound, resist composition and method of forming resist pattern'20118,007,981'Resist composition and method of forming resist pattern'20117,939,243'Resin, resist composition and method of forming resist pattern'20117,927,780'Resist composition, method of forming resist pattern, novel compound and method of producing the same, and acid generator'20117,919,227'Positive resist composition and method of forming resist pattern'20117,855,044'Positive resist composition and method of forming resist pattern'20107,799,507'Positive resist composition for immersion lithography and method for forming resist pattern'20107,776,510'Resist composition, method of forming resist pattern, compound and acid generator'20107,771,911'Process for producing photoresist composition, filter, coater and photoresist composition'20107,767,377'Positive type resist composition, process for forming resist pattern, and process for performing ion implantation'20107,763,412'Polymer, positive resist composition and method for forming resist pattern'20107,745,097'Compound, manufacturing method thereof, acid generator, resist composition and method of forming resist pattern'20107,608,381'Polymer compound, positive resist composition and process for forming resist pattern'20097,575,846'Resist polymer and resist composition'20097,544,460'Resist composition, multilayer body, and method for forming resist pattern'20097,541,138'Resist composition'20097,534,550'Positive resist composition and process for formation of resist patterns'20097,527,909'Resist composition'20097,501,220'Resist composition'20097,501,221'Positive type resist composition and resist pattern formation method using same'20097,488,568'Resist composition, method of forming resist pattern, compound and acid generator'20097,482,108'Polymer compound, acid generator, positive resist composition, and method for formation of resist patterns'20097,435,530'Positive type resist composition and resist pattern formation method using same'20087,390,612'Positive type resist composition and resist pattern formation method using same'20087,326,515'Positive type resist composition and resist pattern formation method using same'20087,323,287'Positive type resist composition and resist pattern formation method using same'20087,316,885'Method of forming resist pattern, positive resist composition, and layered product'20087,316,889'Positive type resist composition and resist pattern formation method using same'20087,316,888'Positive type resist composition and resist pattern formation method using same'20087,312,015'Process for refining crude resin for electronic material'20077,276,575'Process for refining crude resin for resist'20077,183,368'Negative-working photoresist composition'20077,074,543'Positive resist composition and method of forming resist pattern from the same'20066,897,012'Negative-working photoresist composition'2005D0498186'Radiator grille for an automobile'20046,759,176'Positive-working resist composition'20046,749,991'Negative-working photoresist composition'20046,749,989'Positive-working photoresist composition'20046,444,397'Negative-working photoresist composition'20026,010,824'Photosensitive resin composition containing a triazine compound and a pre-sensitized plate using the same, and photosensitive resin composition containing acridine and triazine compounds and a color filter and a pre-sensitized plate using the same'20005,908,734'Image formation method with a post exposure heating step'19995,885,746'Photosensitive resin composition, photosensitive printing plate using the same and method of manufacturing printing master plate'1999

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1999–2013Patents assigned to TOKYO OHKA KOGYO CO LTD (45)· patent assignee history
1999–2015Based in Kanagawa, JP· patent location history
1999–2007Based in Sagamihara, JP· patent location history
2004–2015Patents assigned to NISSAN MOTOR (5)· patent assignee history
2006–2013Based in Kawasaki, JP· patent location history
2009–2013Patents assigned to MITSUBISHI RAYON CO (3)· patent assignee history
2012–2016Patents assigned to IWAI TAKESHI (12)· patent assignee history
2013Patents assigned to OHKOSHI NAOYUKI (3)· patent assignee history
2013Based in Anjo, JP· patent location history
2016Based in Nisshin, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
TOKYO OHKA KOGYO CO LTD451999–2013
IWAI TAKESHIself122012–2016
NISSAN MOTOR52004–2015
MITSUBISHI RAYON CO32009–2013
OHKOSHI NAOYUKI32013
Locations
LocationPatentsSpan
Kawasaki, JP362006–2013
Kanagawa, JP101999–2015
Sagamihara, JP71999–2007
Nisshin, JP12016
Anjo, JP12013