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Inventor

Wayne Chin

Inventor
Etna, NH, US

Overview

4→
Patents
2010–2020
Patent span
Electricity
Primary field (CPC H)

Patents· 4 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

B23Kprimary
B23KSoldering or unsoldering33%
H05HPlasma technique33%
G05BControl or regulating systems in general17%
H02MApparatus for conversion between ac and ac, between ac and dc, or between dc and dc, and for use with mains or similar power supply systems17%
PatentTitleYear
10,610,953Systems and methods for providing power for plasma arc cutting202010,455,682Optimization and control of material processing using a thermal processing torch20199,148,053'Flux saturation controller'20157,778,799'Automated self test for a thermal processing system'2010

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2010–2020Patents assigned to HYPERTHERM INC (4)· patent assignee history
2010–2019Based in Lebanon, NH, US· patent location history
2015–2020Based in Etna, NH, US· patent location history
2019Patents assigned to ANDERSON RICHARD (1)· patent assignee history
2019Patents assigned to BEST GUY (1)· patent assignee history
2019Patents assigned to BRAHAN PETER (1)· patent assignee history
2019Patents assigned to CHIN WAYNE (1)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
HYPERTHERM INC42010–2020
ANDERSON RICHARD12019
BEST GUY12019
BRAHAN PETER12019
CHIN WAYNEself12019
Locations
LocationPatentsSpan
Etna, NH, US22015–2020
Lebanon, NH, US22010–2019