Inventor

Hai Sun

Inventor

Milpitas, CA, US

Overview

2010–2020

Patent span

Physics

Primary field (CPC G)

Patents· 36 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G11Bprimary

G11BInformation storage based on relative movement between record carrier and transducer45%

G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices17%

Y10TTechnical subjects covered by former us classification17%

H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h106%

H01LSemiconductor devices5%

B82YSpecific uses or applications of nanostructures3%

G01RMeasuring electric variables2%

G02BOptical elements, systems or apparatus2%

G03BApparatus or arrangements for taking photographs or for projecting or viewing them2%

H01FMagnets2%

PatentTitleYear

10,847,936Card edge connector with improved grounding member2020 9,940,951PMR writer with non-conformal side gaps2018 9,711,168'Method for providing a magnetic recording write apparatus by predefining side shields'2017 9,558,763'Magnetic recording write apparatus having a pole including an assist portion extending in the cross-track direction'2017 9,406,331'Method for making ultra-narrow read sensor and read transducer device resulting therefrom'2016 9,349,394'Method for fabricating a magnetic writer having a gradient side gap'2016 9,312,064'Method to fabricate a magnetic head including ion milling of read gap using dual layer hard mask'2016 9,274,438'Method and system for exposing photoresist in a microelectric device'2016 9,275,657'Process for making PMR writer with non-conformal side gaps'2016 9,202,480'Double patterning hard mask for damascene perpendicular magnetic recording (PMR) writer'2015 9,202,493'Method of making an ultra-sharp tip mode converter for a HAMR head'2015 9,190,079'Magnetic write pole having engineered radius of curvature and chisel angle profiles'2015 9,183,854'Method to make interferometric taper waveguide for HAMR light delivery'2015 9,104,107'DUV photoresist process'2015 9,034,564'Reader fabrication method employing developable bottom anti-reflective coating'2015 9,007,719'Systems and methods for using double mask techniques to achieve very small features'2015 9,001,467'Method for fabricating side shields in a magnetic writer'2015 8,993,217'Double exposure technique for high resolution disk imaging'2015 8,793,866'Method for providing a perpendicular magnetic recording head'2014 8,703,397'Method for providing side shields for a magnetic recording transducer'2014 8,649,123'Method to eliminate reactive ion etching (RIE) loading effects for damascene perpendicular magnetic recording (PMR) fabrication'2014 8,563,146'Method and system for providing a magnetic recording pole having a dual sidewall angle'2013 8,413,317'Method for fabricating a structure for a microelectric device'2013 8,394,280'Resist pattern protection technique for double patterning application'2013 8,334,093'Method and system for providing a perpendicular magnetic recording head'2012 8,322,023'Method for providing a wrap-around shield for a magnetic recording transducer'2012 8,284,517'Perpendicular magnetic recording head'2012 8,169,473'Method and system for exposing a photoresist in a magnetic device'2012 8,163,185'Method and apparatus for lifting off photoresist beneath an overlayer'2012 8,136,224'Method and system for providing a perpendicular magnetic recording head utilizing a mask having an undercut line'2012 8,072,705'Method and system for providing a magnetic writer using a BARC'2011 7,910,267'Method and system for providing optical proximity correction for structures such as a PMR nose'2011 7,846,643'Method and system for providing a structure in a microelectronic device using a chromeless alternating phase shift mask'2010 7,829,264'Method and system for providing a microelectronic device using a plurality of focus distances'2010 7,785,666'Methods for fabricating a magnetic recording device'2010 7,736,823'Method and system for providing optical proximity correction for structures such as a PMR nose'2010

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2010–2018Patents assigned to WESTERN DIGITAL FREMONT LLC (32)· patent assignee history

2010–2018Based in Milpitas, CA, US· patent location history

2011–2016Patents assigned to SUN HAI (15)· patent assignee history

2011–2016Patents assigned to YUAN HONGPING (11)· patent assignee history

2012–2015Patents assigned to ZHANG JINQIU (7)· patent assignee history

2012–2016Patents assigned to ZENG XIANZHONG (6)· patent assignee history

2020Based in Kunshan, CN· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees

Assignee	Patents	Span
WESTERN DIGITAL FREMONT LLC	32	2010–2018
SUN HAIself	15	2011–2016
YUAN HONGPING	11	2011–2016
ZHANG JINQIU	7	2012–2015
ZENG XIANZHONG	6	2012–2016

Locations

Location	Patents	Span
Milpitas, California, US	35	2010–2018
Kunshan, CN	1	2020