LexDanaLexDanabeta
Inventor

Akimitsu Oishi

Inventor
Hyogo, JP

Overview

3→
Patents
2013–2014
Patent span
Electricity
Primary field (CPC H)

Patents· 3 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1027%
H10DInorganic electric semiconductor devices18%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h1018%
C23CCoating metallic material9%
H01LSemiconductor devices9%
H05HPlasma technique9%
H10FInorganic semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation9%
PatentTitleYear
8,859,434'Etching method'20148,673,781'Plasma etching method'20148,598,049'Deposition method'2013

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2013–2014Patents assigned to MURAKAMI SHOICHI (3)· patent assignee history
2013–2014Patents assigned to OISHI AKIMITSU (3)· patent assignee history
2013–2014Patents assigned to HATASHITA MASAYASU (2)· patent assignee history
2013–2014Patents assigned to SPP TECHNOLOGIES CO LTD (2)· patent assignee history
2013–2014Based in Hyogo, JP· patent location history
2014Patents assigned to SUMITOMO PRECISION PROD CO (1)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
MURAKAMI SHOICHI32013–2014
OISHI AKIMITSUself32013–2014
HATASHITA MASAYASU22013–2014
SPP TECHNOLOGIES CO LTD22013–2014
SUMITOMO PRECISION PROD CO12014
Locations
LocationPatentsSpan
Hyogo, JP32013–2014