Inventor
Antonius Johannus Van Der Net
Inventor
Tilburg, NL
Overview
Patents· 23 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices56%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1022%
C10JProduction of producer gas, water-gas, synthesis gas from solid carbonaceous material, or mixtures containing these gases5%
G03BApparatus or arrangements for taking photographs or for projecting or viewing them5%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests5%
Y10TTechnical subjects covered by former us classification5%
G06FElectric digital data processing2%
PatentTitleYear
10,838,310Lithographic apparatus and device manufacturing method involving a heater202010,254,663Lithographic apparatus and device manufacturing method involving a heater201910,248,033Lithographic apparatus and device manufacturing method20199,811,007'Lithographic apparatus and method of cooling a component in a lithographic apparatus'20179,753,380'Lithographic apparatus and device manufacturing method'20179,599,908'Lithographic apparatus and contamination removal or prevention method'20179,436,097'Lithographic apparatus and device manufacturing method'20169,268,242'Lithographic apparatus and device manufacturing method involving a heater and a temperature sensor'20169,188,880'Lithographic apparatus and device manufacturing method involving a heater'20159,158,206'Lithographic apparatus and contamination removal or prevention method'20159,004,459'Humidifying apparatus, lithographic apparatus and humidifying method'20158,934,082'Lithographic apparatus and device manufacturing method'20158,885,142'Lithographic apparatus and device manufacturing method'20148,810,769'Lithographic apparatus, an illumination system, a projection system and a method of manufacturing a device using a lithographic apparatus'20148,564,757'Lithographic apparatus and a method of operating the apparatus'20138,446,561'Lithographic apparatus and a method of measuring flow rate in a two phase flow'20138,432,531'Lithographic apparatus and a method of operating the apparatus'20138,004,652'Lithographic apparatus and device manufacturing method'20117,924,404'Lithographic apparatus and device manufacturing method'20117,916,269'Lithographic apparatus and contamination removal or prevention method'20117,866,637'Humidifying apparatus, lithographic apparatus and humidifying method'20117,804,575'Lithographic apparatus and device manufacturing method having liquid evaporation control'20107,379,155'Lithographic apparatus and device manufacturing method'2008Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2008–2020Patents assigned to ASML NETHERLANDS BV (23)· patent assignee history
2008–2020Based in Tilburg, NL· patent location history
2011Based in Tillburg, NL· patent location history
2013–2017Patents assigned to VAN DER NET ANTONIUS JOHANNUS (11)· patent assignee history
2013–2015Patents assigned to JANSEN HANS (3)· patent assignee history
2013Patents assigned to KRAMER PIETER JACOB (3)· patent assignee history
2013Patents assigned to KUIJPER ANTHONIE (3)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| ASML NETHERLANDS BV | 23 | 2008–2020 |
| VAN DER NET ANTONIUS JOHANNUSself | 11 | 2013–2017 |
| JANSEN HANS | 3 | 2013–2015 |
| KRAMER PIETER JACOB | 3 | 2013 |
| KUIJPER ANTHONIE | 3 | 2013 |
Locations
| Location | Patents | Span |
|---|---|---|
| Tilburg, NL | 22 | 2008–2020 |
| Tillburg, NL | 1 | 2011 |