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Inventor

Nicole Schoumans

Inventor
's-Hertogenbosch, NL

Overview

3→
Patents
2014–2015
Patent span
Physics
Primary field (CPC G)

Patents· 3 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices60%
G01BMeasuring length, thickness or similar linear dimensions20%
G06FElectric digital data processing20%
PatentTitleYear
8,982,347'Alignment mark deformation estimating method, substrate position predicting method, alignment system and lithographic apparatus'20158,887,107'Inspection method and apparatus and lithographic processing cell'20148,796,684'Lithographic method and arrangement'2014

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2014–2015Patents assigned to ASML NETHERLANDS BV (3)· patent assignee history
2014Patents assigned to GROENENDIJK REMCO JOCHEM SEBASTIAAN (1)· patent assignee history
2014Patents assigned to HEPP BIRGITT NOËLLE CORNELIA LIDUINE (1)· patent assignee history
2014Patents assigned to MOS EVERHARDUS CORNELIS (1)· patent assignee history
2014–2015Based in 's-Hertogenbosch, NL· patent location history
2015Patents assigned to ASML NETHERLANDS N V (1)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
ASML NETHERLANDS BV32014–2015
ASML NETHERLANDS N V12015
GROENENDIJK REMCO JOCHEM SEBASTIAAN12014
HEPP BIRGITT NOËLLE CORNELIA LIDUINE12014
MOS EVERHARDUS CORNELIS12014
Locations
LocationPatentsSpan
's-Hertogenbosch, NL32014–2015