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Inventor

Mingying Ma

Inventor
Shanghai, CN

Overview

1→
Patents
2011
Patent span
Physics
Primary field (CPC G)

Patents· 1 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices100%
PatentTitleYear
8,035,801'Method for in-situ aberration measurement of optical imaging system in lithographic tools'2011

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2011Patents assigned to SHANGHAI MICROELECTRONICS EQUI (1)· patent assignee history
2011Based in Shanghai, CN· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
SHANGHAI MICROELECTRONICS EQUI12011
Locations
LocationPatentsSpan
Shanghai, CN12011