Inventor

TIMOTHY ZIEMBA

Inventor
US

Overview

30→
Patents
2021–2025
Patent span
Electricity
Primary field (CPC H)

Patents· 30 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H01Jprimary
H01JElectric discharge tubes or discharge lamps24%
H03KPulse technique19%
H02MApparatus for conversion between ac and ac, between ac and dc, or between dc and dc, and for use with mains or similar power supply systems15%
H01LSemiconductor devices8%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h108%
Y02BClimate change mitigation technologies related to buildings, e.g. housing, house appliances or related end-user applications6%
H03HImpedance networks, e.g. resonant circuits5%
H03MCoding5%
H05KPrinted circuits5%
H05GX-ray technique3%
PatentTitleYear
12,456,604Nanosecond pulser RF isolation for plasma systems202512,451,811Nanosecond pulser bias compensation202512,437,967Ion current droop compensation202512,354,832High voltage plasma control202512,348,228Bipolar high voltage pulser202512,230,477Nanosecond pulser ADC system202512,198,898Variable output impedance RF generator202511,979,141Efficient IGBT switching202411,967,484Ion current droop compensation202411,875,971Efficient energy recovery in a nanosecond pulser circuit202411,824,542Bipolar high voltage pulser202311,824,454Wafer biasing in a plasma chamber202311,810,761Nanosecond pulser ADC system202311,728,138Ion current droop compensation202311,689,107Nanosecond pulser bias compensation202311,670,484Variable output impedance RF generator202311,646,176Efficient nanosecond pulser with source and sink capability for plasma control applications202311,636,998Nanosecond pulser pulse generation202311,587,768Nanosecond pulser thermal management202311,558,048High voltage nanosecond pulser202311,551,908Spatially variable wafer bias power system202311,532,457Precise plasma control system202211,527,383Nanosecond pulser RF isolation for plasma systems202211,430,635Precise plasma control system202211,404,246Nanosecond pulser bias compensation with correction202211,404,247Ion current droop compensation202211,302,518Efficient energy recovery in a nanosecond pulser circuit202211,227,745Plasma sheath control for RF plasma reactors202211,222,767Nanosecond pulser bias compensation202211,159,156High voltage nanosecond pulser2021

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2021–2025Patents assigned to EAGLE HARBOR TECH INC (28)· patent assignee history
2021–2025Based in US· patent location history
2024–2025Patents assigned to EHT Ventures LLC (3)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
EAGLE HARBOR TECH INC282021–2025
EHT Ventures LLC32024–2025
Locations
LocationPatentsSpan
US302021–2025