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Inventor

Ryuzou Houchin

Inventor
Osaka, JP

Overview

4→
Patents
2010–2013
Patent span
Electricity
Primary field (CPC H)

Patents· 4 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1040%
F27DDetails or accessories of furnaces, kilns, ovens or retorts, in so far as they are of kinds occurring in more than one kind of furnace30%
H01JElectric discharge tubes or discharge lamps30%
PatentTitleYear
8,591,754'Plasma processing apparatus and plasma processing method'20138,563,332'Wafer reclamation method and wafer reclamation apparatus'20138,231,798'Plasma processing apparatus and plasma processing method'20127,736,528'Plasma processing apparatus and plasma processing method'2010

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2010–2013Patents assigned to PANASONIC CORP (4)· patent assignee history
2010–2013Based in Osaka, JP· patent location history
2012–2013Patents assigned to HOUCHIN RYUZOU (3)· patent assignee history
2012–2013Patents assigned to OKITA SHOGO (3)· patent assignee history
2012–2013Patents assigned to SUZUKI HIROYUKI (3)· patent assignee history
2012–2013Patents assigned to ASAKURA HIROMI (2)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
PANASONIC CORP42010–2013
HOUCHIN RYUZOUself32012–2013
OKITA SHOGO32012–2013
SUZUKI HIROYUKI32012–2013
ASAKURA HIROMI22012–2013
Locations
LocationPatentsSpan
Osaka, JP42010–2013