Inventor
HIROAKI IWAOKA
Inventor
JP
Overview
Patents· 9 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices82%
C23CCoating metallic material18%
PatentTitleYear
12,346,018Reflective mask blank, reflective mask, method of manufacturing reflective mask blank, and method of manufacturing reflective mask202512,339,580Reflective mask blank for EUV lithography and substrate equipped with conductive film202512,298,660Reflective mask blank for EUV lithography, reflective mask for EUV lithography, and method for manufacturing same202512,235,574Reflective mask blank, reflective mask, method of manufacturing reflective mask blank, and method of manufacturing reflective mask202512,222,640Reflective mask blank, reflective mask, method of manufacturing reflective mask blank, and method of manufacturing reflective mask202512,105,412Reflective mask blank, reflective mask, method of manufacturing reflective mask blank, and method of manufacturing reflective mask202412,001,134Reflective mask blank, reflective mask, method of manufacturing reflective mask blank, and method of manufacturing reflective mask202411,953,822Reflective mask blank for EUV lithography, reflective mask for EUV lithography, and method for manufacturing same202411,829,065Reflective mask blank, reflective mask, method of manufacturing reflective mask blank, and method of manufacturing reflective mask2023Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2023–2025Patents assigned to AGC INC (9)· patent assignee history
2023–2025Based in JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| AGC INC | 9 | 2023–2025 |
Locations
| Location | Patents | Span |
|---|---|---|
| JP | 9 | 2023–2025 |