Inventor
ANTON BERNHARD VAN OOSTEN
Inventor
BE
Overview
Patents· 6 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices43%
G02BOptical elements, systems or apparatus14%
G01BMeasuring length, thickness or similar linear dimensions7%
G01NInvestigating or analysing materials by determining their chemical or physical properties7%
G06NComputing arrangements based on specific computational models7%
G06TImage data processing or generation, in general7%
G21KHandling of particles or ionising radiation not otherwise provided for7%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h107%
PatentTitleYear
12,112,260Metrology apparatus and method for determining a characteristic of one or more structures on a substrate202411,822,255Process window based on defect probability202311,460,782Matching pupil determination202211,314,174Methods and patterning devices and apparatuses for measuring focus performance of a lithographic apparatus, device manufacturing method202211,287,748Guided patterning device inspection202211,150,560Projection system and mirror and radiation source for a lithographic apparatus2021Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2021–2024Patents assigned to ASML NETHERLANDS BV (6)· patent assignee history
2021Based in NL· patent location history
2022–2024Based in BE· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| ASML NETHERLANDS BV | 6 | 2021–2024 |
Locations
| Location | Patents | Span |
|---|---|---|
| BE | 5 | 2022–2024 |
| NL | 1 | 2021 |