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Inventor

Shinji Kishimura

Inventor
Itami, JP

Overview

57→
Patents
1992–2009
Patent span
Physics
Primary field (CPC G)

Patents· 57 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices42%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests30%
C08FMacromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds13%
C07CAcyclic or carbocyclic compounds4%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h104%
C08GMacromolecular compounds obtained otherwise than by reactions only involving unsaturated carbon-to-carbon bonds2%
G03CPhotosensitive materials for photographic purposes2%
A23LFoods, foodstuffs or non-alcoholic beverages, not otherwise provided for1%
B65DContainers for storage or transport of articles or materials, e.g. bags, barrels, bottles, boxes, cans, cartons, crates, drums, jars, tanks, hoppers, forwarding containers1%
C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients1%
PatentTitleYear
7,588,876'Resist material and pattern formation method'20097,413,843'Sulfonamide compound, polymer compound, resist material and pattern formation method'20087,378,216'Resist material and pattern formation method'20087,241,553'Polymer, resist composition, and patterning process'20077,169,530'Polymer compound, resist material and pattern formation method'20077,169,869'Polymers, resist compositions and patterning process'20077,166,418'Sulfonamide compound, polymer compound, resist material and pattern formation method'20077,125,641'Polymers, resist compositions and patterning process'20067,125,642'Sulfonates, polymers, resist compositions and patterning process'20067,125,643'Polymers, resist compositions and patterning process'20067,078,147'Polymers, resist compositions and patterning process'20067,067,231'Polymers, resist compositions and patterning process'20067,060,775'Polymer compound, resist material and pattern formation method'20067,041,428'Pattern-forming material and method of forming pattern'20067,005,228'Polymers, resist compositions and patterning process'20067,001,707'Resist compositions and patterning process'20066,946,235'Polymers, resist compositions and patterning process'20056,933,095'Polymers, resist compositions and patterning process'20056,916,592'Esters, polymers, resist compositions and patterning process'20056,875,556'Resist compositions and patterning process'20056,872,514'Polymers, resist compositions and patterning process'20056,864,037'Polymers, resist compositions and patterning process'20056,861,197'Polymers, resist compositions and patterning process'20056,855,477'Chemically amplified resist compositions and patterning process'20056,830,869'Pattern forming material and method of pattern formation'20046,824,955'Polymers, resist compositions and patterning process'20046,806,029'Pattern formation material and pattern formation method'20046,790,586'Resist compositions and patterning process'20046,753,132'Pattern formation material and pattern formation method'20046,737,213'Pattern formation material and method'20046,710,148'Polymers, resist compositions and patterning process'20046,689,536'Pattern formation material and pattern formation method'20046,673,523'Pattern formation method'20046,660,447'Polymers, resist compositions and patterning process'20036,645,694'Pattern formation material and pattern formation method'20036,632,582'Pattern formation material and pattern formation method'20036,603,037'Ester compounds'20036,582,880'Polymers, resist compositions and patterning process'20036,576,398'Pattern formation material and method'20036,537,736'Patten formation method'20036,531,259'Pattern formation method and pattern formation material'20036,528,240'Pattern formation method'20036,521,393'Pattern formation method'20036,511,787'Polymers, resist compositions and patterning process'20036,511,786'Pattern formation material and pattern formation method'20036,475,706'Pattern formation method'20026,461,790'Polymers, chemical amplification resist compositions and patterning process'20026,444,395'Pattern formation material and method'20026,124,081'Method of forming a resist pattern'20005,905,016'Resist pattern forming method and resist material'19995,885,754'Method of forming a pattern'19995,648,199'Method of forming a resist pattern utilizing an acid water-soluble material overlayer on the resist film'19975,591,654'Method of manufacturing a semiconductor device and a resist composition used therein'19975,426,016'Method of forming and removing resist pattern'19955,252,433'Method of forming and removing resist pattern'19935,217,851'Pattern forming method capable of providing an excellent pattern of high resolution power and high sensitivity'19935,123,998'Method of forming patterns'1992

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1992–2000Patents assigned to MITSUBISHI ELECTRIC CORP (9)· patent assignee history
1992–2009Based in Hyogo, JP· patent location history
1993–2007Based in Itami, JP· patent location history
1999–2000Based in Tokyo, JP· patent location history
2002–2008Patents assigned to MATSUSHITA ELECTRIC INDUSTRIAL CO LTD (35)· patent assignee history
2002–2005Patents assigned to SHINETSU CHEMICAL CO (13)· patent assignee history
2002Patents assigned to MASTSUCHITA ELECTRIC IND CO LT (1)· patent assignee history
2002Based in Takatsuki, JP· patent location history
2003–2007Patents assigned to CENTRAL GLASS CO LTD (22)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD352002–2008
CENTRAL GLASS CO LTD222003–2007
SHINETSU CHEMICAL CO132002–2005
MITSUBISHI ELECTRIC CORP91992–2000
MASTSUCHITA ELECTRIC IND CO LT12002
Locations
LocationPatentsSpan
Itami, JP311993–2007
Hyogo, JP231992–2009
Tokyo, JP21999–2000
Takatsuki, JP12002