Inventor
Yuji Nonami
Inventor
Kyoto, JP
Overview
Patents· 4 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices57%
G06FElectric digital data processing14%
H10DInorganic electric semiconductor devices14%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1014%
PatentTitleYear
8,330,248'Semiconductor device, mask for fabrication of semiconductor device, and optical proximity correction method'20128,278,014'Photomask and pattern formation method using the same'20128,007,959'Photomask and pattern formation method using the same'20117,998,641'Photomask and pattern formation method using the same'2011Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2011–2012Patents assigned to PANASONIC CORP (4)· patent assignee history
2011–2012Based in Kyoto, JP· patent location history
2012Patents assigned to MISAKA AKIO (2)· patent assignee history
2012Patents assigned to NONAMI YUJI (2)· patent assignee history
2012Patents assigned to ARAI HIDEYUKI (1)· patent assignee history
2012Patents assigned to HARADA CHIKA (1)· patent assignee history
2012Based in Shiga, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| PANASONIC CORP | 4 | 2011–2012 |
| MISAKA AKIO | 2 | 2012 |
| NONAMI YUJIself | 2 | 2012 |
| ARAI HIDEYUKI | 1 | 2012 |
| HARADA CHIKA | 1 | 2012 |
Locations
| Location | Patents | Span |
|---|---|---|
| Kyoto, JP | 3 | 2011–2012 |
| Shiga, JP | 1 | 2012 |