LexDanaLexDanabeta
Inventor

Akifumi Mishima

Inventor
Saitama, JP

Overview

12→
Patents
1987–2014
Patent span
Chemistry
Primary field (CPC C)

Patents· 12 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

C23Cprimary
C23CCoating metallic material24%
C22CAlloys15%
G11BInformation storage based on relative movement between record carrier and transducer12%
C04BLime, magnesia9%
B23KSoldering or unsoldering6%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h106%
B24BMachines, devices, or processes for grinding or polishing3%
C09KMaterials for miscellaneous applications, not provided for elsewhere3%
C22FChanging the physical structure of non-ferrous metals and non-ferrous alloys3%
G06FElectric digital data processing3%
PatentTitleYear
8,815,149'Semi-reflective film and reflective film for optical recording medium, and Ag alloy sputtering target for forming semi-reflective film or reflective film for optical recording medium'20148,721,961'Au—Sn alloy bump including no large void and method of producing same'20148,466,077'Sputtering target for forming ZrO2-In2O3 based protective film for optical storage medium'20138,268,141'High-strength sputtering target for forming protective film for optical recording medium'20128,254,753'Subtitle generating apparatus and method'20128,105,467'High strength sputtering target for forming phosphor film in electroluminescence element'20126,393,418'Method of and apparatus for sorting a file'20026,176,986'Sputtering target of dielectrics having high strength and a method for manufacturing same'20015,997,704'Sputtering target for depositing ferroelectric film, method for preparing the same, and method for preparing a DRAM using the same'19995,338,425'Target units'19945,282,946'Platinum-cobalt alloy sputtering target and method for manufacturing same'19944,659,632'Cobalt alloy for build-up welding having improved resistance to weld crack'1987

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1987–2001Based in Omiya, JP· patent location history
1994–2014Patents assigned to MITSUBISHI MATERIALS CORP (9)· patent assignee history
1994–2012Based in Sanda, JP· patent location history
2002–2012Patents assigned to SONY CORP (2)· patent assignee history
2002–2012Based in Kanagawa, JP· patent location history
2012–2014Patents assigned to MISHIMA AKIFUMI (6)· patent assignee history
2012–2014Patents assigned to KOMIYAMA SHOZO (3)· patent assignee history
2012–2013Patents assigned to ZHANG SHOUBIN (3)· patent assignee history
2012–2014Based in Saitama, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
MITSUBISHI MATERIALS CORP91994–2014
MISHIMA AKIFUMIself62012–2014
KOMIYAMA SHOZO32012–2014
ZHANG SHOUBIN32012–2013
SONY CORP22002–2012
Locations
LocationPatentsSpan
Saitama, JP42012–2014
Sanda, JP31994–2012
Omiya, JP31987–2001
Kanagawa, JP22002–2012