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Inventor

Raijiro Koga

Inventor
Tsuchiura, JP

Overview

3→
Patents
2001–2002
Patent span
Performing operations
Primary field (CPC B)

Patents· 3 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

B24Bprimary
B24BMachines, devices, or processes for grinding or polishing43%
B08BCleaning in general29%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1029%
PatentTitleYear
6,386,963'Conditioning disk for conditioning a polishing pad'20026,358,124'Pad conditioner cleaning apparatus'20026,217,430'Pad conditioner cleaning apparatus'2001

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2001–2002Patents assigned to APPLIED MATERIALS INC (3)· patent assignee history
2001–2002Based in Tsuchiura, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
APPLIED MATERIALS INC32001–2002
Locations
LocationPatentsSpan
Tsuchiura, JP32001–2002