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Inventor

Haruhiko Yamagata

Inventor
Tokyo, JP

Overview

2→
Patents
2005–2007
Patent span
Chemistry
Primary field (CPC C)

Patents· 2 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

C23Cprimary
C23CCoating metallic material33%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices33%
Y10TTechnical subjects covered by former us classification33%
PatentTitleYear
7,217,481'Photomask blank, photomask, methods of manufacturing the same and methods of forming micropattern'20076,899,979'Photomask blank, photomask, methods of manufacturing the same, and method of forming micropattern'2005

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2005Patents assigned to HOYO CORP (1)· patent assignee history
2005–2007Based in Tokyo, JP· patent location history
2007Patents assigned to HOYA CORP (1)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
HOYA CORP12007
HOYO CORP12005
Locations
LocationPatentsSpan
Tokyo, JP22005–2007