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Inventor

Satoshi Une

Inventor
Kudamatsu, JP

Overview

4→
Patents
2011–2019
Patent span
Electricity
Primary field (CPC H)

Patents· 4 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1040%
H01JElectric discharge tubes or discharge lamps30%
H10DInorganic electric semiconductor devices20%
H01LSemiconductor devices10%
PatentTitleYear
10,229,838Plasma etching method20198,277,563'Plasma processing method'20128,143,175'Dry etching method'20127,909,933'Plasma processing method'2011

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2011–2019Patents assigned to HITACHI HIGH TECH CORP (4)· patent assignee history
2011–2012Based in Kudamatsu, JP· patent location history
2012Patents assigned to SAKAGUCHI MASAMICHI (2)· patent assignee history
2012Patents assigned to UNE SATOSHI (2)· patent assignee history
2012Patents assigned to ICHIMARU TOMOYOSHI (1)· patent assignee history
2019Patents assigned to HITACH HIGH TECH CORPORATION (1)· patent assignee history
2019Based in Tokyo, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
HITACHI HIGH TECH CORP42011–2019
SAKAGUCHI MASAMICHI22012
UNE SATOSHIself22012
HITACH HIGH TECH CORPORATION12019
ICHIMARU TOMOYOSHI12012
Locations
LocationPatentsSpan
Kudamatsu, JP32011–2012
Tokyo, JP12019