Inventor

MING-HSI YEH

Inventor

TW

Overview

2021–2026

Patent span

Electricity

Primary field (CPC H)

Patents· 85 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H01Lprimary

H01LSemiconductor devices29%

H10DInorganic electric semiconductor devices27%

H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1022%

H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h1013%

B82YSpecific uses or applications of nanostructures3%

C09KMaterials for miscellaneous applications, not provided for elsewhere2%

C23FNon-mechanical removal of metallic material from surface1%

B08BCleaning in general1%

H10BElectronic memory devices1%

C23CCoating metallic material0%

PatentTitleYear

12,557,577Method of forming semiconductor device using wet etching chemistry2026 12,520,531Semiconductor device and manufacturing method thereof2026 12,495,603Semiconductor device and manufacturing method for the same2025 12,490,497Metal gate patterning2025 12,469,789Semiconductor structure2025 12,469,710Method of manufacturing a semiconductor device2025 12,439,643Fin shape modification2025 12,394,669Wet cleaning with tunable metal recess for via plugs2025 12,389,661Method for modifying metal-including material in semiconductor manufacturing process2025 12,381,092Etchant for etching a cobalt-containing member in a semiconductor structure and method of etching a cobalt-containing member in a semiconductor structure2025 12,381,081Method of breaking through etch stop layer2025 12,376,372Fin field-effect transistor and method of forming the same2025 12,376,358Semiconductor devices and methods of manufacturing thereof2025 12,376,326Gate resistance improvement and method thereof2025 12,369,348Fin Field-Effect Transistor device and method of forming the same2025 12,362,189Semiconductor devices and methods of manufacturing thereof2025 12,363,966Semiconductor devices and method of forming the same2025 12,317,525Fin field-effect transistor device and method of forming the same2025 12,308,248Semiconductor device and method of manufacture2025 12,278,288Fin field-effect transistor device having hybrid work function layer stack2025 12,272,598Conductive feature of a semiconductor device2025 12,237,400Method of forming semiconductor device2025 12,224,204Semiconductor device and method2025 12,191,380Semiconductor device and method2025 12,183,637Fin field-effect transistor and method of forming the same2024 12,183,823Fin field-effect transistor with a gate structure having a dielectric protection layer2024 12,176,422Controlling fin-thinning through feedback2024 12,136,566Semiconductor device and method of manufacture2024 12,119,390Gate spacer structures and methods for forming the same2024 12,080,556Fin field-effect transistor and method of forming the same2024 12,074,035Method for partially removing tungsten in semiconductor manufacturing process2024 12,068,385Oxidation to mitigate dry etch and/or wet etch fluorine residue2024 12,051,753Fin field-effect transistor device having hybrid work function layer stack2024 12,051,619Semiconductor device and method of manufacture2024 12,051,626Fin Field-Effect transistor and method of forming the same2024 12,046,476Wet etching chemistry and method of forming semiconductor device using the same2024 12,021,145Fin field-effect transistor device having hybrid work function layer stack2024 12,015,077Metal gate using monolayers2024 11,996,470Fin field-effect transistor and method of forming the same2024 11,996,324Conductive feature of a semiconductor device and method of forming same2024 11,978,801Fin field-effect transistor device and method of forming the same2024 11,972,982Method of manufacturing a semiconductor device2024 11,923,437Controlling fin-thinning through feedback2024 11,923,428Fin field-effect transistor and method of forming the same2024 11,923,201Self-protective layer formed on high-K dielectric layer2024 11,901,441Fin field-effect transistor and method of forming the same2024 11,901,180Method of breaking through etch stop layer2024 11,854,816Semiconductor devices and methods of manufacturing thereof2023 11,854,903Footing removal in cut-metal process2023 11,854,870Etch method for interconnect structure2023 11,855,193Fin field-effect transistor device and method of forming the same2023 11,848,239Patterning method and structures resulting therefrom2023 11,823,945Method for cleaning semiconductor wafer2023 11,817,330Method for processing substrate2023 11,810,978Gate resistance improvement and method thereof2023 11,749,753Methods of forming a semiconductor device with a gate structure having a dielectric protection layer2023 11,735,426Semiconductor device and method of manufacture2023 11,735,425Fin field-effect transistor and method of forming the same2023 11,715,670FIN field-effect transistor and method of forming the same2023 11,682,669Metal gate structure and methods thereof2023 11,658,225Fin field-effect transistor and method of forming the same2023 11,594,455Semiconductor device and manufacturing method for the same2023 11,588,041Fin field-effect transistor and method of forming the same2023 11,587,875Connecting structure and method for forming the same2023 11,557,512Wet cleaning with tunable metal recess for via plugs2023 11,522,083Fin field-effect transistor device and method of forming the same2022 11,488,859Semiconductor device and method2022 11,488,857Semiconductor device and method of manufacture using a contact etch stop layer (CESL) breakthrough process2022 11,476,124Etchant for etching a cobalt-containing member in a semiconductor structure and method of etching a cobalt-containing member in a semiconductor structure2022 11,437,493Gate spacer structures and methods for forming the same2022 11,424,347Semiconductor device and method2022 11,424,185Semiconductor device and manufacturing method thereof2022 11,404,322Method of manufacturing a semiconductor device2022 11,404,552Fin Field-Effect Transistor and method of forming the same2022 11,398,391Substrate processing apparatus and method for processing substrate2022 11,380,793Fin field-effect transistor device having hybrid work function layer stack2022 11,309,190Semiconductor device and method of manufacture2022 11,309,185Fin field-effect transistor and method of forming the same2022 11,276,571Method of breaking through etch stop layer2022 11,257,924Metal gate using monolayers2022 11,227,940Fin field-effect transistor device and method of forming the same2022 11,201,084Fin field-effect transistor device and method of forming the same2021 11,195,752Semiconductor device and method of forming same2021 11,189,714Gate stack structure and method for forming the same2021 11,158,726Controlling fin-thinning through feedback2021

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2021–2026Patents assigned to TAIWAN SEMICONDUCTOR MFG CO LTD (85)· patent assignee history

2021–2025Patents assigned to TAIWAN SEMICONDUTOR MFG COMPANY LTD (2)· patent assignee history

2021–2026Based in TW· patent location history

2023Patents assigned to TAIWAN SEMICONDUCTOR MFG (1)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees

Assignee	Patents	Span
TAIWAN SEMICONDUCTOR MFG CO LTD	85	2021–2026
TAIWAN SEMICONDUTOR MFG COMPANY LTD	2	2021–2025
TAIWAN SEMICONDUCTOR MFG	1	2023

Locations

Location	Patents	Span
TW	85	2021–2026