Inventor

Masaki Tabata

Inventor
Joetsu-shi, JP

Overview

10→
Patents
2003–2017
Patent span
Chemistry
Primary field (CPC C)

Patents· 10 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

C08Bprimary
C08BPolysaccharides22%
B24BMachines, devices, or processes for grinding or polishing9%
B24CAbrasive or related blasting with particulate material9%
C03CChemical composition of glasses, glazes or vitreous enamels9%
G02FOptical devices or arrangements for the control of light by modification of the optical properties of the media of the elements involved therein9%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices9%
Y10TTechnical subjects covered by former us classification9%
B01DSeparation4%
B01JChemical or physical processes, e.g. catalysis or colloid chemistry4%
C01BNon-metallic elements4%

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2003–2017Patents assigned to SHINETSU CHEMICAL CO (10)· patent assignee history
2003Based in Nishikamo-gun, JP· patent location history
2006–2016Based in Niigata, JP· patent location history
2014–2017Patents assigned to TABATA MASAKI (6)· patent assignee history
2014–2017Patents assigned to NARITA MITSUO (5)· patent assignee history
2014–2017Patents assigned to UMEZAWA HIROSHI (5)· patent assignee history
2014–2017Patents assigned to YOSHIDA ATSUSHI (5)· patent assignee history
2014–2017Based in Joetsu-shi, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
SHINETSU CHEMICAL CO102003–2017
TABATA MASAKIself62014–2017
NARITA MITSUO52014–2017
UMEZAWA HIROSHI52014–2017
YOSHIDA ATSUSHI52014–2017
Locations
LocationPatentsSpan
Joetsu-shi, JP52014–2017
Niigata, JP42006–2016
Nishikamo-gun, JP12003