Inventor

Mohan K. Bhan

Inventor

Cupertino, CA, US

Overview

1998–2003

Patent span

Electricity

Primary field (CPC H)

Patents· 13 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

C23Cprimary

C23CCoating metallic material36%

H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1030%

H01JElectric discharge tubes or discharge lamps15%

Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests9%

H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h106%

H10DInorganic electric semiconductor devices3%

PatentTitleYear

6,573,181'Method of forming contact structures using nitrogen trifluoride preclean etch process and a titanium chemical vapor deposition step'2003 6,410,089'Chemical vapor deposition of copper using profiled distribution of showerhead apertures'2002 6,319,728'Method for treating a deposited film for resistivity reduction'2001 6,296,712'Chemical vapor deposition hardware and process'2001 6,291,028'Method and apparatus for improving the film quality of plasma enhanced CVD films at the interface'2001 6,289,843'Method and apparatus for improving the film quality of plasma enhanced CVD films at the interface'2001 6,223,685'Film to tie up loose fluorine in the chamber after a clean process'2001 6,121,163'Method and apparatus for improving the film quality of plasma enhanced CVD films at the interface'2000 6,090,167'Method and apparatus for improving film stability of halogen-doped silicon oxide films'2000 6,050,506'Pattern of apertures in a showerhead for chemical vapor deposition'2000 6,020,035'Film to tie up loose fluorine in the chamber after a clean process'2000 6,001,728'Method and apparatus for improving film stability of halogen-doped silicon oxide films'1999 5,827,785'Method for improving film stability of fluorosilicate glass films'1998

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1998–2003Patents assigned to APPLIED MATERIALS INC (13)· patent assignee history

1998–2003Based in Cupertino, CA, US· patent location history

2000–2001Based in Sunnyvale, CA, US· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees

Assignee	Patents	Span
APPLIED MATERIALS INC	13	1998–2003

Locations

Location	Patents	Span
Cupertino, California, US	10	1998–2003
Sunnyvale, California, US	3	2000–2001