Inventor
MARIO JOHANNES MEISSL
Inventor
US
Overview
Patents· 15 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices34%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1018%
B29CShaping or joining of plastics16%
H01LSemiconductor devices11%
A61BDiagnosis3%
A61FFilters implantable into blood vessels3%
A61GTransport, personal conveyances, or accommodation specially adapted for patients or disabled persons3%
B29KIndexing scheme associated with subclasses b29b, b29c or b29d, relating to moulding materials or to materials for moulds, reinforcements, fillers or preformed parts, e.g. inserts3%
B82YSpecific uses or applications of nanostructures3%
G01LMeasuring force, stress, torque, work, mechanical power, mechanical efficiency, or fluid pressure3%
PatentTitleYear
12,498,634System and method for generating control values for overlay control of an imprint tool202512,463,081Apparatus including a bonding head and a method of using the same202512,366,800Method for improving accuracy of imprint force application in imprint lithography202511,994,797System and method for shaping a film with a scaled calibration measurement parameter202411,776,840Superstrate chuck, method of use, and method of manufacturing an article202311,656,546Exposure apparatus for uniform light intensity and methods of using the same202311,614,693Method of determining the initial contact point for partial fields and method of shaping a surface202311,604,409Template replication202311,590,687Systems and methods for reducing pressure while shaping a film202311,550,216Systems and methods for curing a shaped film202311,480,871Apparatus and method for improving accuracy of imprint force application in imprint lithography202211,454,883Template replication202211,443,940Apparatus for uniform light intensity and methods of using the same202211,347,144Overlay improvement in nanoimprint lithography202211,161,280Strain and kinetics control during separation phase of imprint process2021Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2021Patents assigned to MOLECULAR IMPRINTS INC (1)· patent assignee history
2021–2025Based in US· patent location history
2022–2025Patents assigned to CANON KK (14)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| CANON KK | 14 | 2022–2025 |
| MOLECULAR IMPRINTS INC | 1 | 2021 |
Locations
| Location | Patents | Span |
|---|---|---|
| US | 15 | 2021–2025 |