Inventor

Denis Alexandrovich Glushkov

Inventor
Alfter, DE

Overview

9→
Patents
2013–2021
Patent span
Physics
Primary field (CPC G)

Patents· 9 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices33%
H05GX-ray technique17%
B82YSpecific uses or applications of nanostructures13%
G21KHandling of particles or ionising radiation not otherwise provided for13%
G02BOptical elements, systems or apparatus8%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h108%
G01NInvestigating or analysing materials by determining their chemical or physical properties4%
H01JElectric discharge tubes or discharge lamps4%

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2013–2018Patents assigned to ASML NETHERLANDS BV (7)· patent assignee history
2013–2018Patents assigned to GLUSHKOV DENIS ALEXANDROVICH (5)· patent assignee history
2013–2018Patents assigned to BANINE VADIM YEVGENYEVICH (4)· patent assignee history
2013–2018Patents assigned to YAKUNIN ANDREI MIKHAILOVICH (3)· patent assignee history
2013–2018Based in Alfter, DE· patent location history
2015–2018Patents assigned to SJMAENOK LEONID AIZIKOVITCH (3)· patent assignee history
2015–2018Based in Witten, DE· patent location history
2016–2021Based in Nieuwegein, NL· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
ASML NETHERLANDS BV72013–2018
GLUSHKOV DENIS ALEXANDROVICHself52013–2018
BANINE VADIM YEVGENYEVICH42013–2018
SJMAENOK LEONID AIZIKOVITCH32015–2018
YAKUNIN ANDREI MIKHAILOVICH32013–2018
Locations
LocationPatentsSpan
Alfter, DE42013–2018
Witten, DE32015–2018
Nieuwegein, NL22016–2021