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Inventor

Fabio R. Zurcher

Inventor
Brisbane, CA, US

Overview

64→
Patents
2005–2021
Patent span
Chemistry
Primary field (CPC C)

Patents· 64 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1010%
B01JChemical or physical processes, e.g. catalysis or colloid chemistry10%
C07CAcyclic or carbocyclic compounds9%
Y02PClimate change mitigation technologies in the production or processing of goods9%
H10DInorganic electric semiconductor devices9%
C09DCoating compositions, e.g. paints, varnishes or lacquers6%
B82YSpecific uses or applications of nanostructures4%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h104%
C01BNon-metallic elements3%
C01GCompounds containing metals not covered by subclasses c01d or c01f3%
PatentTitleYear
11,078,132Nanowire catalysts and methods for their use and preparation202111,000,835Catalysts for natural gas processes202110,865,166Catalysts for petrochemical catalysis202010,836,689Systems and methods for the oxidative coupling of methane202010,780,420Heterogeneous catalysts202010,654,769Catalysts for petrochemical catalysis202010,308,565Catalysts for petrochemical catalysis201910,300,465Catalysts for natural gas processes201910,195,603Production of ethylene with nanowire catalysts20199,963,402Catalysts for petrochemical catalysis20189,956,544Heterogeneous catalysts20189,751,818'Nanowire catalysts and methods for their use and preparation'20179,751,079'Catalysts for natural gas processes'20179,738,571'Catalysts for petrochemical catalysis'20179,718,054'Production of ethylene with nanowire catalysts'20179,670,113'Natural gas processing and systems'20179,640,390'Method for modifying and controlling the threshold voltage of thin film transistors'20179,580,367'Natural gas processing and systems'20179,556,086'Oxidative coupling of methane systems and methods'20179,469,577'Oxidative coupling of methane systems and methods'20169,446,397'Method for isolation of nanomaterials'20169,446,387'Catalysts for petrochemical catalysis'20169,196,641'Printed dopant layers'20159,040,762'Catalysts for petrochemical catalysis'20158,960,558'MOS electronic article surveillance, RF and/or RF identification tag/device, and methods for making and using the same'20158,962,517'Nanowire catalysts and methods for their use and preparation'20158,921,256'Catalysts for petrochemical catalysis'20148,900,915'Epitaxial structures and methods of forming the same'20148,853,677'Metal inks for improved contact resistance'20148,846,507'Silicon polymers, methods of polymerizing silicon compounds, and methods of forming thin films from such silicon polymers'20148,840,857'Heterocyclic semiconductor precursor compounds, compositions containing the same, and methods of making such compounds and compositions'20148,624,049'Dopant group-substituted semiconductor precursor compounds, compositions containing the same, and methods of making such compounds and compositions'20148,603,426'Method of making a silicon-containing film'20138,461,284'Silicon polymers, methods of polymerizing silicon compounds, and methods of forming thin films from such silicon polymers'20138,460,983'Method for modifying and controlling the threshold voltage of thin film transistors'20138,372,194'Methods of forming a doped semiconductor thin film, doped semiconductor thin film structures, doped silane compositions, and methods of making such compositions'20138,367,031'Silane compositions, methods of making the same, method for forming a semiconducting and/or silicon-containing film, and thin film structures formed therefrom'20138,304,780'Printed dopant layers'20128,211,396'Heterocyclic semiconductor precursor compounds, compositions containing the same, and methods of making such compounds and compositions'20128,164,423'MOS electronic article surveillance, RF and/or RF identification tag/device, and methods for making and using the same'20128,124,040'Methods of making silane compositions'20128,092,867'Silicon polymers, methods of polymerizing silicon compounds, and methods of forming thin films from such silicon polymers'20128,066,805'Metal inks, methods of making the same, and methods for printing and/or forming metal films'20117,981,482'Methods of forming a doped semiconductor thin film, doped semiconductor thin film structures, doped silane compositions, and methods of making such compositions'20117,977,240'Metal inks for improved contact resistance'20117,879,696'Compositions and methods for forming a semiconducting and/or silicon-containing film, and structures formed therefrom'20117,799,302'Silane compositions, methods of making the same, method for forming a semiconducting and/or silicon-containing film, and thin film structures formed therefrom'20107,767,520'Printed dopant layers'20107,767,261'Methods for forming passivated semiconductor nanoparticles'20107,701,011'Printed dopant layers'20107,674,926'Dopant group-substituted semiconductor precursor compounds, compositions containing the same, and methods of making such compounds and compositions'20107,553,545'Compositions and methods for forming a semiconducting and/or silicon-containing film, and structures formed therefrom'20097,498,015'Method of making silane compositions'20097,422,708'Compositions for forming a semiconducting and/or silicon-containing film, and structures formed therefrom'20087,387,260'MOS electronic article surveillance, RF and/or RF identification tag/device, and methods for making and using the same'20087,314,513'Methods of forming a doped semiconductor thin film, doped semiconductor thin film structures, doped silane compositions, and methods of making such compositions'20087,315,068'Interface layer for the fabrication of electronic devices'20087,259,100'Nanoparticles and method for making the same'20077,259,101'Nanoparticles and method for making the same'20077,152,804'MOS electronic article surveillance, RF and/or RF identification tag/device, and methods for making and using the same'20067,078,276'Nanoparticles and method for making the same'20066,957,608'Contact print methods'20056,911,385'Interface layer for the fabrication of electronic devices'20056,878,184'Nanoparticle synthesis and the formation of inks therefrom'2005

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2005–2014Patents assigned to KOVIO INC (33)· patent assignee history
2005–2021Based in Brisbane, CA, US· patent location history
2006Based in Brisane, CA, US· patent location history
2008–2011Based in Brisban, CA, US· patent location history
2011–2015Patents assigned to ROCKENBERGER JOERG (17)· patent assignee history
2011–2014Patents assigned to GUO WENZHUO (9)· patent assignee history
2012–2014Patents assigned to RIDLEY BRENT (10)· patent assignee history
2014–2020Patents assigned to SILURIA TECHNOLOGIES INC (18)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
KOVIO INC332005–2014
SILURIA TECHNOLOGIES INC182014–2020
ROCKENBERGER JOERG172011–2015
RIDLEY BRENT102012–2014
GUO WENZHUO92011–2014
Locations
LocationPatentsSpan
Brisbane, California, US612005–2021
Brisban, California, US22008–2011
Brisane, California, US12006