Inventor
Iwao Sugiura
Inventor
Kawasaki, JP
Overview
Patents· 14 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Wprimary
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h1024%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1015%
H10FInorganic semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation13%
C09DCoating compositions, e.g. paints, varnishes or lacquers11%
H01LSemiconductor devices9%
Y10TTechnical subjects covered by former us classification9%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests7%
H10DInorganic electric semiconductor devices4%
C08LCompositions of macromolecular compounds2%
G02BOptical elements, systems or apparatus2%
PatentTitleYear
9,985,065Solid-state imaging device20189,171,877'Semiconductor imaging device having ligth transmission layers formed relative to a guard ring structure in a predetermined manner'20159,099,534'Manufacturing method of semiconductor device, semiconductor device and electronic apparatus'20158,786,089'Manufacturing method of semiconductor device, semiconductor device and electronic apparatus'20148,759,933'Solid-state image pickup element, method of manufacturing the same, and electronic apparatus using the same'20148,373,786'Solid-state imaging device, manufacturing method thereof, and electronic device'20137,642,650'Semiconductor device having a pillar structure'20107,483,818'Structural analysis program, a structural analysis method, a structural analysis apparatus, and a production process of a semiconductor integrated circuit'20097,235,866'Low dielectric constant film material, film and semiconductor device using such material'20077,170,177'Semiconductor apparatus'20076,958,525'Low dielectric constant film material, film and semiconductor device using such material'20056,780,498'Silicon-based composition, low dielectric constant film, semiconductor device, and method for producing low dielectric constant film'20046,727,515'Insulation film forming material, insulation film, method for forming the insulation film, and semiconductor device'20046,613,834'Low dielectric constant film material, film and semiconductor device using such material'2003Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2003–2007Patents assigned to FUJITSU LTD (6)· patent assignee history
2003–2010Based in Kawasaki, JP· patent location history
2009Based in Nagano, JP· patent location history
2013–2018Patents assigned to SONY CORP (6)· patent assignee history
2013–2015Patents assigned to SUGIURA IWAO (4)· patent assignee history
2013–2014Patents assigned to TABUCHI KIYOTAKA (2)· patent assignee history
2013–2018Based in Kanagawa, JP· patent location history
2014–2015Based in Kumamoto, JP· patent location history
2015Patents assigned to AJISAWA HARUHIKO (1)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| FUJITSU LTD | 6 | 2003–2007 |
| SONY CORP | 6 | 2013–2018 |
| SUGIURA IWAOself | 4 | 2013–2015 |
| TABUCHI KIYOTAKA | 2 | 2013–2014 |
| AJISAWA HARUHIKO | 1 | 2015 |
Locations
| Location | Patents | Span |
|---|---|---|
| Kawasaki, JP | 7 | 2003–2010 |
| Kanagawa, JP | 4 | 2013–2018 |
| Kumamoto, JP | 2 | 2014–2015 |
| Nagano, JP | 1 | 2009 |