Inventor
Manfred Gawein Tenner
Inventor
Eindhoven, NL
Overview
Patents· 9 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices60%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1013%
G02FOptical devices or arrangements for the control of light by modification of the optical properties of the media of the elements involved therein7%
G03BApparatus or arrangements for taking photographs or for projecting or viewing them7%
H01LSemiconductor devices7%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h107%
PatentTitleYear
9,753,377'Deformation pattern recognition method, pattern transferring method, processing device monitoring method, and lithographic apparatus'20178,980,724'Alignment target contrast in a lithographic double patterning process'20158,709,908'Improving alignment target contrast in a lithographic double patterning process'20148,625,096'Method and system for increasing alignment target contrast'20148,208,121'Alignment mark and a method of aligning a substrate comprising such an alignment mark'20125,917,604'Alignment device and lithographic apparatus provided with such a device'19995,910,847'Method of determining the radiation dose in a lithographic apparatus'19995,673,101'Method of repetitively imaging a mask pattern on a substrate, and apparatus for performing the method'19975,485,272'Radiation-source unit for generating a beam having two directions of polarisation and two frequencies'1996Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1996–1999Patents assigned to PHILIPS CORP (4)· patent assignee history
1996–2017Based in Eindhoven, NL· patent location history
2012–2017Patents assigned to ASML NETHERLANDS BV (5)· patent assignee history
2012–2014Patents assigned to TENNER MANFRED GAWEIN (3)· patent assignee history
2014–2015Patents assigned to ASML HOLDING NV (3)· patent assignee history
2014Patents assigned to DOYTCHEVA MAYA ANGELOVA (2)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| ASML NETHERLANDS BV | 5 | 2012–2017 |
| PHILIPS CORP | 4 | 1996–1999 |
| ASML HOLDING NV | 3 | 2014–2015 |
| TENNER MANFRED GAWEINself | 3 | 2012–2014 |
| DOYTCHEVA MAYA ANGELOVA | 2 | 2014 |
Locations
| Location | Patents | Span |
|---|---|---|
| Eindhoven, NL | 9 | 1996–2017 |