Inventor
THOMAS H. OSTERHELD
Inventor
US
Overview
Patents· 19 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1026%
B24BMachines, devices, or processes for grinding or polishing23%
G06NComputing arrangements based on specific computational models12%
H01LSemiconductor devices12%
G05BControl or regulating systems in general7%
G01BMeasuring length, thickness or similar linear dimensions6%
G06TImage data processing or generation, in general4%
G01DMeasuring not specially adapted for a specific variable3%
G01HMeasurement of mechanical vibrations or ultrasonic, sonic or infrasonic waves3%
B08BCleaning in general1%
PatentTitleYear
12,491,603Passive acoustic monitoring and acoustic sensors for chemical mechanical polishing202512,479,062Determining substrate orientation with acoustic signals202512,447,579Chemical mechanical polishing vibration measurement using optical sensor202512,403,560Determining substrate precession with acoustic signals202512,343,840Control of processing parameters for substrate polishing with substrate precession202512,257,665Machine vision as input to a CMP process control algorithm202512,020,159Training spectrum generation for machine learning system for spectrographic monitoring202411,931,860Consumable part monitoring in chemical mechanical polisher202411,931,853Control of processing parameters for substrate polishing with angularly distributed zones using cost function202411,780,046Polishing system with annular platen or polishing pad202311,731,238Monitoring of polishing pad texture in chemical mechanical polishing202311,701,749Monitoring of vibrations during chemical mechanical polishing202311,699,595Imaging for monitoring thickness in a substrate cleaning system202311,651,207Training spectrum generation for machine learning system for spectrographic monitoring202311,577,356Machine vision as input to a CMP process control algorithm202311,571,786Consumable part monitoring in chemical mechanical polisher202311,511,388Polishing system with support post and annular platen or polishing pad202211,507,824Training spectrum generation for machine learning system for spectrographic monitoring202211,453,097Chemical mechanical polishing apparatus and methods2022Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2022–2025Patents assigned to APPLIED MATERIALS INC (19)· patent assignee history
2022–2025Based in US· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| APPLIED MATERIALS INC | 19 | 2022–2025 |
Locations
| Location | Patents | Span |
|---|---|---|
| US | 19 | 2022–2025 |