Inventor
Murty S. Polavarapu
Inventor
Vienna, VA, US
Overview
Patents· 12 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G11Cprimary
G11CStatic stores17%
H10DInorganic electric semiconductor devices17%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1017%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h1011%
C03CChemical composition of glasses, glazes or vitreous enamels6%
G02BOptical elements, systems or apparatus6%
H01GCapacitors6%
H01LSemiconductor devices6%
H10FInorganic semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation6%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests6%
PatentTitleYear
9,417,383'Three-dimensional electronic photonic integrated circuit fabrication process'20169,027,226'Method for implementing prompt dose mitigating capacitor'20156,794,733'Increasing the susceptability of an integrated circuit to ionizing radiation'20046,737,327'Method for forming an interated resister having aligned body and contact'20046,665,161'Semiconductor circuit having increased susceptibility to ionizing radiation'20036,624,067'Process for removing a silicon-containing material through use of a byproduct generated during formation of a diffusion barrier layer'20036,529,403'Integrated resistor having aligned body and contact and method for forming the same'20036,468,860'Integrated circuit capable of operating at two different power supply voltages'20026,455,392'Integrated resistor having aligned body and contact and method for forming the same'20026,441,440'Semiconductor device and circuit having low tolerance to ionizing radiation'20024,734,157'Selective and anisotropic dry etching'19884,624,739'Process using dry etchant to avoid mask-and-etch cycle'1986Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1986–1988Patents assigned to IBM (2)· patent assignee history
1986–1988Based in Manassas, VA, US· patent location history
2002–2004Patents assigned to BAE SYSTEMS INFORMATION (5)· patent assignee history
2002–2015Based in Vienna, VA, US· patent location history
2003Patents assigned to BAE SYSTEMS AND INFORMATION AN (1)· patent assignee history
2004Patents assigned to BAE INFORMATION AND ELECTRONIC (1)· patent assignee history
2015–2016Patents assigned to BAE SYS INF & ELECT SYS INTEG (2)· patent assignee history
2016Based in Oakston, VA, US· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| BAE SYSTEMS INFORMATION | 5 | 2002–2004 |
| BAE SYS INF & ELECT SYS INTEG | 2 | 2015–2016 |
| IBM | 2 | 1986–1988 |
| BAE INFORMATION AND ELECTRONIC | 1 | 2004 |
| BAE SYSTEMS AND INFORMATION AN | 1 | 2003 |
Locations
| Location | Patents | Span |
|---|---|---|
| Vienna, Virginia, US | 9 | 2002–2015 |
| Manassas, Virginia, US | 2 | 1986–1988 |
| Oakston, Virginia, US | 1 | 2016 |