Inventor
Hung-Yin Lin
Inventor
Taichung, TW
Overview
Patents· 3 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H01Lprimary
H01LSemiconductor devices38%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1038%
H10DInorganic electric semiconductor devices25%
PatentTitleYear
9,613,816'Advanced process control method for controlling width of spacer and dummy sidewall in semiconductor device'20179,412,671'Method for controlling processing temperature in semiconductor fabrication'20169,177,875'Advanced process control method for controlling width of spacer and dummy sidewall in semiconductor device'2015Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2015–2017Patents assigned to TAIWAN SEMICONDUCTOR MFG CO LTD (3)· patent assignee history
2015Patents assigned to TAIWAN SEMINCONDUCTOR MFG CO LTD (1)· patent assignee history
2015–2017Based in Taichung, TW· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| TAIWAN SEMICONDUCTOR MFG CO LTD | 3 | 2015–2017 |
| TAIWAN SEMINCONDUCTOR MFG CO LTD | 1 | 2015 |
Locations
| Location | Patents | Span |
|---|---|---|
| Taichung, TW | 3 | 2015–2017 |