Inventor
Masatoshi Kaneda
Inventor
Koshi, JP
Overview
Patents· 21 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1034%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices18%
H01LSemiconductor devices10%
D04BKnitting8%
A41BShirts6%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests6%
B05CApparatus for applying fluent materials to surfaces, in general4%
B05DProcesses for applying fluent materials to surfaces, in general4%
B63CLaunching, hauling-out, or dry-docking of vessels2%
C23CCoating metallic material2%
PatentTitleYear
10,487,426Tubular fabric, method of knitting tubular fabric, and sock20199,514,951'Substrate processing method, substrate processing apparatus, substrate processing system and recording medium'20169,362,150'Substrate processing apparatus'20169,105,519'Substrate treatment apparatus, substrate treatment method, and non-transitory storage medium'20158,893,650'Substrate treatment apparatus, substrate treatment method, and non-transitory storage medium'20148,776,393'Substrate cooling apparatus, substrate cooling method, and storage medium'20148,748,780'Substrate processing apparatus, substrate processing method, and computer-readable storage medium'20148,544,300'Sock'20138,277,884'Coating and processing apparatus and method'20128,186,077'Heating apparatus, heating method, and computer readable storage medium'20127,992,318'Heating apparatus, heating method, and computer readable storage medium'20117,971,280'Socks'20117,615,117'Coating and processing apparatus and method'20097,587,915'Sock'20097,431,584'Heat processing apparatus and heat processing method'20087,151,239'Heat treating apparatus and heat treating method'20067,049,553'Substrate processing apparatus and substrate processing method'20066,655,891'Substrate treatment system, substrate transfer system, and substrate transfer method'20036,425,722'Substrate treatment system, substrate transfer system, and substrate transfer method'20026,368,776'Treatment apparatus and treatment method'20026,074,154'Substrate treatment system, substrate transfer system, and substrate transfer method'2000Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2000–2016Patents assigned to TOKYO ELECTRON LTD (17)· patent assignee history
2002–2012Based in Kikuchi-gun, JP· patent location history
2006Based in Suwa, JP· patent location history
2009–2019Patents assigned to OKAMOTO CORP (4)· patent assignee history
2009–2011Based in Koryo-cho, JP· patent location history
2011–2016Based in Koshi, JP· patent location history
2012–2014Patents assigned to KANEDA MASATOSHI (5)· patent assignee history
2012Patents assigned to HAMADA MASAHITO (1)· patent assignee history
2013Patents assigned to IWAKI AKINOBU (1)· patent assignee history
2013–2019Based in Nara, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| TOKYO ELECTRON LTD | 17 | 2000–2016 |
| KANEDA MASATOSHIself | 5 | 2012–2014 |
| OKAMOTO CORP | 4 | 2009–2019 |
| HAMADA MASAHITO | 1 | 2012 |
| IWAKI AKINOBU | 1 | 2013 |
Locations
| Location | Patents | Span |
|---|---|---|
| Koshi, JP | 8 | 2011–2016 |
| Kikuchi-gun, JP | 5 | 2002–2012 |
| Nara, JP | 2 | 2013–2019 |
| Koryo-cho, JP | 2 | 2009–2011 |
| Suwa, JP | 2 | 2006 |