Inventor
Kyung Hawn Cho
Inventor
Kyungki-do, KR
Overview
Patents· 3 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Dprimary
H10DInorganic electric semiconductor devices29%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1029%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests29%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h1014%
PatentTitleYear
6,340,625'Method for simultaneously forming thinner and thicker parts of a dual oxide layer having varying thicknesses'20026,207,588'Method for simultaneously forming thinner and thicker parts of a dual oxide layer having varying thicknesses'20016,074,930'Method for forming a trench isolation structure comprising an interface treatment for trench liner and a subsequent annealing process'2000Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2000–2002Patents assigned to SAMSUNG ELECTRONICS CO LTD (3)· patent assignee history
2000–2002Based in Kyungki-do, KR· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| SAMSUNG ELECTRONICS CO LTD | 3 | 2000–2002 |
Locations
| Location | Patents | Span |
|---|---|---|
| Kyungki-do, KR | 3 | 2000–2002 |