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Inventor

Shyuhei Shinozuka

Inventor
Atsugi, JP

Overview

2→
Patents
2001–2002
Patent span
Chemistry
Primary field (CPC C)

Patents· 2 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

C23Fprimary
C23FNon-mechanical removal of metallic material from surface50%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1050%
PatentTitleYear
6,447,632'Apparatus and nozzle device for gaseous polishing'20026,315,858'Gas polishing apparatus and method'2001

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2001–2002Patents assigned to EBARA CORP (2)· patent assignee history
2001–2002Based in Atsugi, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
EBARA CORP22001–2002
Locations
LocationPatentsSpan
Atsugi, JP22001–2002