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Inventor

Heisen Ryu

Inventor
Daejeon, KR

Overview

2→
Patents
2003–2021
Patent span
Chemistry
Primary field (CPC C)

Patents· 2 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

B82Yprimary
B82YSpecific uses or applications of nanostructures11%
C08FMacromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds11%
C08JWorking-up11%
C08LCompositions of macromolecular compounds11%
C09DCoating compositions, e.g. paints, varnishes or lacquers11%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices11%
H01LSemiconductor devices11%
H01TSpark gaps11%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1011%
PatentTitleYear
10,934,426Method for producing a polymer film by using a polymer composition20216,606,230'Chip-type surge absorber and method for producing the same'2003

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2003Patents assigned to MITSUBISHI MATERIALS CORP (1)· patent assignee history
2003Based in Tokyo, JP· patent location history
2021Patents assigned to LG CHEMICAL LTD (1)· patent assignee history
2021Based in Daejeon, KR· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
LG CHEMICAL LTD12021
MITSUBISHI MATERIALS CORP12003
Locations
LocationPatentsSpan
Daejeon, KR12021
Tokyo, JP12003