Inventor

Shi-Shang Jang

Inventor
Hsinchu, TW

Overview

4→
Patents
2007–2019
Patent span
Physics
Primary field (CPC G)

Patents· 4 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G05Bprimary
G05BControl or regulating systems in general33%
B01DSeparation11%
B01LChemical or physical laboratory apparatus for general use11%
C02FTreatment of water, waste water, sewage, or sludge11%
C07CAcyclic or carbocyclic compounds11%
G06FElectric digital data processing11%
Y02PClimate change mitigation technologies in the production or processing of goods11%

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2007–2019Based in Hsinchu, TW· patent location history
2013Patents assigned to JANG SHI-SHANG (2)· patent assignee history
2013Patents assigned to NAT UNIV TSING HUA (2)· patent assignee history
2013Patents assigned to PAN TAIN-HONG (2)· patent assignee history
2013Patents assigned to WONG SHAN-HILL (2)· patent assignee history
2019Patents assigned to CHANG CHUN PETROCHEMICAL CO LTD (1)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
JANG SHI-SHANGself22013
NAT UNIV TSING HUA22013
PAN TAIN-HONG22013
WONG SHAN-HILL22013
CHANG CHUN PETROCHEMICAL CO LTD12019
Locations
LocationPatentsSpan
Hsinchu, TW42007–2019