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Inventor

Christian Felix Hermanns

Inventor
DE

Overview

3→
Patents
2024–2026
Patent span
Physics
Primary field (CPC G)

Patents· 3 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices25%
G01NInvestigating or analysing materials by determining their chemical or physical properties17%
G06NComputing arrangements based on specific computational models17%
C01BNon-metallic elements8%
C23CCoating metallic material8%
H01JElectric discharge tubes or discharge lamps8%
H01LSemiconductor devices8%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h108%
PatentTitleYear
12,535,729Method and apparatus for mask repair202612,517,442Apparatus and method for removing a single particulate from a substrate202611,886,126Apparatus and method for removing a single particulate from a substrate2024

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2024–2026Patents assigned to ZEISS CARL SMT GMBH (3)· patent assignee history
2024–2026Based in DE· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
ZEISS CARL SMT GMBH32024–2026
Locations
LocationPatentsSpan
DE32024–2026