Inventor
Motoshi Sasaki
Inventor
Chiba, JP
Overview
Patents· 23 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
C09Dprimary
C09DCoating compositions, e.g. paints, varnishes or lacquers17%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1016%
C08GMacromolecular compounds obtained otherwise than by reactions only involving unsaturated carbon-to-carbon bonds14%
C04BLime, magnesia9%
C03CChemical composition of glasses, glazes or vitreous enamels6%
C08LCompositions of macromolecular compounds6%
C23CCoating metallic material6%
Y10TTechnical subjects covered by former us classification5%
C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients3%
H01BCables3%
PatentTitleYear
10,983,052Electricity measuring type surface plasmon resonance sensor and electricity measuring type surface plasmon resonance sensor chip used in the same20219,273,224'Coating agent composition'20169,175,177'Coating composition'20159,006,372'Silicone resins and their use in polymer compositions'20158,609,742'High energy ray-curable composition'20137,795,360'Coating composition'20107,368,500'Film-forming silicone resin composition'20087,074,874'Liquid alkoxysilyl-functional silicone resins, method for their preparation, and curable silicone resin compositions'20066,706,798'Water repellent silicone coating agent composition'20046,448,175'Method for forming insulating thin films'20026,358,804'Semiconductor device and method for the fabrication thereof'20026,255,373'Curable silicone resin composition'20016,214,748'Semiconductor device and method for the fabrication thereof'20016,191,183'Method for the formation of silica thin films'20016,149,966'Composition and process for forming electrically insulating thin films'20006,074,695'Composition and process for forming electrically insulating thin films'20005,486,564'High purity polyhydrogen silsesquioxane resin for electronic coatings'19965,416,190'Method for the molecular weight fractionation of polyhydrogen silsesquioxane'19955,380,555'Methods for the formation of a silicon oxide film'19955,372,842'Method for the formation of a silicon oxide film'19945,370,904'Method for the formation of silicon oxide films'19945,370,903'Method for the formation of a silicon oxide film'19945,338,817'Method for the preparation of a silicone resin'1994Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1994–2008Patents assigned to DOW CORNING TORAY SILICONE (16)· patent assignee history
1994–2013Based in Chiba, JP· patent location history
2010–2016Patents assigned to DOW CORNING TORAY CO LTD (3)· patent assignee history
2013–2016Patents assigned to SASAKI MOTOSHI (4)· patent assignee history
2013–2015Patents assigned to DOW CORNING (3)· patent assignee history
2015–2016Patents assigned to ONODERA SATOSHI (3)· patent assignee history
2015Based in Ichihara, JP· patent location history
2016Based in Ichihari, JP· patent location history
2021Based in Sapporo, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| DOW CORNING TORAY SILICONE | 16 | 1994–2008 |
| SASAKI MOTOSHIself | 4 | 2013–2016 |
| DOW CORNING | 3 | 2013–2015 |
| DOW CORNING TORAY CO LTD | 3 | 2010–2016 |
| ONODERA SATOSHI | 3 | 2015–2016 |
Locations
| Location | Patents | Span |
|---|---|---|
| Chiba, JP | 19 | 1994–2013 |
| Ichihara, JP | 2 | 2015 |
| Sapporo, JP | 1 | 2021 |
| Ichihari, JP | 1 | 2016 |