Inventor
Masayuki Ishizaka
Inventor
Kodaira, JP
Overview
Patents· 4 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Bprimary
H10BElectronic memory devices40%
H10DInorganic electric semiconductor devices40%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h1020%
PatentTitleYear
6,770,528'Method of forming a data-storing capacitive element made in an insulating film on a semiconductor substrate'20046,717,202'HSG semiconductor capacitor with migration inhibition layer'20046,524,927'Semiconductor device and method of fabricating the same'20036,444,405'Method of forming conductive layers in the trenches or through holes made in an insulating film on a semiconductors substrate'2002Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2002–2004Patents assigned to HITACHI ULSI SYS CO LTD (4)· patent assignee history
2002–2003Patents assigned to HITACHI LTD (2)· patent assignee history
2002–2004Based in Kodaira, JP· patent location history
2004Patents assigned to RENESAS TECH CORP (2)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| HITACHI ULSI SYS CO LTD | 4 | 2002–2004 |
| HITACHI LTD | 2 | 2002–2003 |
| RENESAS TECH CORP | 2 | 2004 |
Locations
| Location | Patents | Span |
|---|---|---|
| Kodaira, JP | 4 | 2002–2004 |