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Inventor

JACOBUS JOHANNUS LEONARDUS HENDRICUS VERSPAY

Inventor
NL

Overview

1→
Patents
2022
Patent span
Physics
Primary field (CPC G)

Patents· 1 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices50%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1050%
PatentTitleYear
11,378,893Lithographic apparatus and device manufacturing method involving a heater2022

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2022Patents assigned to ASML NETHERLANDS BV (1)· patent assignee history
2022Based in NL· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
ASML NETHERLANDS BV12022
Locations
LocationPatentsSpan
NL12022