Inventor

Aoi Muta

Inventor

Osaka, JP

Overview

2010–2020

Patent span

Physics

Primary field (CPC G)

Patents· 21 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

A45Dprimary

A45DHairdressing or shaving equipment21%

G06VImage or video recognition or understanding14%

G06TImage data processing or generation, in general13%

G06KGraphical data reading12%

G09BEducational or demonstration appliances12%

G06FElectric digital data processing8%

H01MProcesses or means, e.g. batteries, for the direct conversion of chemical energy into electrical energy6%

Y02EReduction of greenhouse gas [ghg] emissions, related to energy generation, transmission or distribution6%

G06QInformation and communication technology [ict] specially adapted for administrative, commercial, financial, managerial or supervisory purposes4%

A61BDiagnosis1%

PatentTitleYear

10,660,425Makeup assistance device, makeup assistance method, and makeup assistance program2020 10,413,042Makeup support device, makeup support method, and makeup support program2019 10,342,316Makeup support device, makeup support method, and makeup support program2019 10,299,568Makeup application assistance device, makeup application assistance method, and makeup application assistance program2019 10,292,481Makeup application assistance device, makeup application assistance method, and makeup application assistance program2019 10,264,870Makeup application assistance device, makeup application assistance system, and makeup application assistance method2019 10,251,463Makeup application assistance device, makeup application assistance method, and makeup application assistance program2019 10,249,211Makeup application assistance device, makeup application assistance method, and makeup application assistance program2019 10,242,589Makeup application assistance device, makeup application assistance method, and makeup application assistance program2019 10,028,569Makeup application assistance device, makeup application assistance system, and makeup application assistance method2018 10,010,155Makeup support device, makeup support method, and makeup support program2018 9,986,812Makeup application assistance device, makeup application assistance system, and makeup application assistance method2018 9,846,803Makeup supporting device, makeup supporting system, makeup supporting method, and non-transitory computer-readable recording medium2017 9,812,030'Makeup application assistance device, makeup application assistance method, and makeup application assistance program'2017 9,681,736'Makeup application assistance device, makeup application assistance method, and makeup application assistance program'2017 9,615,647'Makeup application assistance device, makeup application assistance method, and makeup application assistance program'2017 8,394,545'Fuel cell system and operating method thereof'2013 8,383,278'Fuel cell system and operating method thereof'2013 8,192,893'Membrane-membrane reinforcing membrane assembly, membrane-catalyst layer assembly, membrane-electrode assembly, and polymer electrolyte fuel cell'2012 8,192,895'Membrane-membrane reinforcing member assembly, membrane-catalyst layer assembly, membrane-electrode assembly, and polymer electrolyte fuel cell'2012 RE041695'Fuel cell system'2010

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2010–2019Patents assigned to PANASONIC CORP (9)· patent assignee history

2010–2020Based in Osaka, JP· patent location history

2012–2013Patents assigned to MUTA AOI (4)· patent assignee history

2012–2013Patents assigned to TSUJI YOICHIRO (4)· patent assignee history

2013Patents assigned to GEMBA MIHO (2)· patent assignee history

2017–2020Patents assigned to PANASONIC IP MAN CO LTD (16)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees

Assignee	Patents	Span
PANASONIC IP MAN CO LTD	16	2017–2020
PANASONIC CORP	9	2010–2019
MUTA AOIself	4	2012–2013
TSUJI YOICHIRO	4	2012–2013
GEMBA MIHO	2	2013

Locations

Location	Patents	Span
Osaka, JP	21	2010–2020