Inventor

Yasumasa Norisue

Inventor
Tokyo, JP

Overview

28→
Patents
1991–2011
Patent span
Chemistry
Primary field (CPC C)

Patents· 28 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

C08Lprimary
C08LCompositions of macromolecular compounds21%
C08GMacromolecular compounds obtained otherwise than by reactions only involving unsaturated carbon-to-carbon bonds19%
H05KPrinted circuits14%
Y10TTechnical subjects covered by former us classification12%
C08FMacromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds11%
C07CAcyclic or carbocyclic compounds8%
C09KMaterials for miscellaneous applications, not provided for elsewhere5%
C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients3%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests3%
B32BLayered products, i.e. products built-up of strata of flat or non-flat, e.g. cellular or honeycomb, form1%
PatentTitleYear
7,951,877'Process for the production of vinyl compound'20117,786,219'Cyanate-terminated polyphenylene ether'20107,632,912'Carboxylic acid-modified bisphenol epoxy di(meth)acrylate'20097,560,518'(Meth)acrylated epoxy-terminated polyphenylene ether'20097,541,408'Curable resin composition, curable film and cured film'20097,511,089'Polyphenylene ether oligomer sulfonic acid salt, making method, flame retardant resin composition, and molded article'20097,446,154'Carboxylic acid-modified biphenyl epoxy diacrylate'20087,393,904'(Meth)acrylate-terminated polyphenylene ether'20087,388,057'Di(meth)acrylate of epoxy-terminated polyphenylene ether'20087,276,563'Polyphenylene ether oligomer compound, derivatives thereof and use thereof'20077,247,682'Bifunctional phenylene ether oligomer, its derivatives, its use and process for the production thereof'20077,192,651'Resin composition and prepreg for laminate and metal-clad laminate'20077,193,019'Process for the production of vinyl compound'20077,193,030'Acid anhydride and polyimide using the same'20077,071,266'Curable resin composition and cured product thereof'20066,995,195'Vinyl compound and cured product thereof'20066,962,744'Bifunctional phenylene ether oligomer, its derivatives, its use and process for the production thereof'20056,835,785'Polyphenylene ether oligomer compound, derivatives thereof and use thereof'20046,835,786'(Meth)acrylate compound and cured product thereof'20046,821,581'Optically active compound and liquid crystal composition containing the compound'20046,805,921'Optically active compound and nematic liquid crystal composition containing the compound'20046,794,481'Bifunctional phenylene ether oligomer, its derivatives, its use and process for the production thereof'20046,730,371'Optically active compound and liquid crystal composition containing the compound'20046,689,920'Bifunctional biphenyl and process for producing bifunctional phenylene ether oligomer compound using the same'20046,677,475'Optically active compound and liquid crystal composition containing the compound'20045,418,291'Thermoplastic resin compositions comprising PPE, polystyrene, an ethylene co-oligomer, diblock copolymers and triblock copolymers'19955,328,945'Resin composition of polyphenylene ether and polyamide'19945,021,197'Process for production of sulfonium compounds'1991

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1991–2010Patents assigned to MITSUBISHI GAS CHEMICAL CO (27)· patent assignee history
1991–2011Based in Tokyo, JP· patent location history
1994–1995Based in Hiratsuka, JP· patent location history
2004Based in Katsushika-ku, JP· patent location history
2009Patents assigned to SHINETSU CHEMICAL CO (1)· patent assignee history
2011Patents assigned to MITAUBISHI GAS CHEMICAL COMPANY INC (1)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
MITSUBISHI GAS CHEMICAL CO271991–2010
MITAUBISHI GAS CHEMICAL COMPANY INC12011
SHINETSU CHEMICAL CO12009
Locations
LocationPatentsSpan
Tokyo, JP251991–2011
Hiratsuka, JP21994–1995
Katsushika-ku, JP12004