Inventor

Rene Oesterholt

Inventor
Vught, NL

Overview

10→
Patents
2007–2013
Patent span
Physics
Primary field (CPC G)

Patents· 10 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices59%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1041%

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2007–2013Patents assigned to ASML NETHERLANDS BV (10)· patent assignee history
2007–2013Based in Vught, NL· patent location history
2007–2009Based in 's-Hertogenbosch, NL· patent location history
2013Patents assigned to LEVASIER LEON MARTIN (1)· patent assignee history
2013Patents assigned to LOOPSTRA ERIK ROELOF (1)· patent assignee history
2013Patents assigned to OESTERHOLT RENE (1)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
ASML NETHERLANDS BV102007–2013
LEVASIER LEON MARTIN12013
LOOPSTRA ERIK ROELOF12013
OESTERHOLT RENEself12013
Locations
LocationPatentsSpan
Vught, NL52007–2013
's-Hertogenbosch, NL52007–2009