Inventor
Atsushi Uemoto
Inventor
Tokyo, JP
Overview
Patents· 32 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H01Jprimary
H01JElectric discharge tubes or discharge lamps52%
G01NInvestigating or analysing materials by determining their chemical or physical properties22%
B82YSpecific uses or applications of nanostructures3%
G01QScanning-probe techniques or apparatus3%
G01TMeasurement of nuclear or x-radiation3%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h103%
G01RMeasuring electric variables2%
G02BOptical elements, systems or apparatus2%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices2%
G06FElectric digital data processing2%
PatentTitleYear
11,133,149Focused ion beam apparatus202111,073,453Automatic sample preparation apparatus and automatic sample preparation method202110,677,697Automatic sample preparation apparatus202010,658,147Charged particle beam apparatus202010,485,087Portable information terminal, beam irradiation system, and program201910,242,842Method for cross-section processing and observation and apparatus therefor201910,236,159Charged particle beam apparatus201910,186,398Sample positioning method and charged particle beam apparatus201910,096,449Cross-section processing-and-observation method and cross-section processing-and-observation apparatus201810,088,401Automatic sample preparation apparatus20189,966,226Cross-section processing and observation method and cross-section processing and observation apparatus20189,934,938Focused ion beam apparatus, method for observing cross-section of sample by using the same, and storage medium20189,741,535'Charged particle beam apparatus'20179,620,333'Charged particle beam apparatus'20179,548,185'Cross section processing method and cross section processing apparatus'20179,368,323'Charged particle beam device, control method for charged particle beam device, and cross-section processing observation apparatus'20169,347,896'Cross-section processing-and-observation method and cross-section processing-and-observation apparatus'20169,336,987'Charged particle beam apparatus'20169,318,303'Charged particle beam apparatus'20169,287,087'Sample observation method, sample preparation method, and charged particle beam apparatus'20169,275,827'Charged particle beam apparatus having needle probe that tracks target position changes'20169,245,713'Charged particle beam apparatus'20169,218,937'Charged particle beam apparatus having improved needle movement control'20159,202,671'Charged particle beam apparatus and sample processing method using charged particle beam apparatus'20159,080,945'Cross-section processing and observation method and cross-section processing and observation apparatus'20159,024,280'Composite charged particle beam apparatus'20158,664,598'Electron microscope and specimen analyzing method'20148,642,980'Composite charged particle beam apparatus'20147,571,639'Method of correcting opaque defect of photomask using atomic force microscope fine processing device'20097,442,925'Working method using scanning probe'20086,852,973'Scanning charged particle microscope'20056,621,082'Automatic focusing system for scanning electron microscope equipped with laser defect detection function'2003Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2003–2015Based in Chiba, JP· patent location history
2005–2014Patents assigned to SII NANOTECHNOLOGY INC (4)· patent assignee history
2014–2021Patents assigned to HITACHI HIGH TECH SCIENCE CORP (24)· patent assignee history
2014–2015Patents assigned to UEMOTO ATSUSHI (2)· patent assignee history
2014–2021Based in Tokyo, JP· patent location history
2015Patents assigned to ASAHATA TATSUYA (1)· patent assignee history
2017Patents assigned to HITACHI HIGH-TECH SCIENCE CORP (3)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| HITACHI HIGH TECH SCIENCE CORP | 24 | 2014–2021 |
| SII NANOTECHNOLOGY INC | 4 | 2005–2014 |
| HITACHI HIGH-TECH SCIENCE CORP | 3 | 2017 |
| UEMOTO ATSUSHIself | 2 | 2014–2015 |
| ASAHATA TATSUYA | 1 | 2015 |
Locations
| Location | Patents | Span |
|---|---|---|
| Tokyo, JP | 26 | 2014–2021 |
| Chiba, JP | 6 | 2003–2015 |