Inventor
Hisashi Yoshida
Inventor
Kanagawa, JP
Overview
Patents· 76 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H01Lprimary
H01LSemiconductor devices16%
H10HInorganic light-emitting semiconductor devices having potential barriers15%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1012%
H10DInorganic electric semiconductor devices11%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests4%
C09KMaterials for miscellaneous applications, not provided for elsewhere3%
H01JElectric discharge tubes or discharge lamps3%
LOC153%
H01SDevices using the process of light amplification by stimulated emission of radiation [laser] to amplify or generate light2%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h102%
PatentTitleYear
11,127,533Solid electrolytic capacitor and method for manufacturing same202111,114,836Semiconductor device, intelligent power module and power conversion apparatus202111,107,915Semiconductor device202111,107,760Semiconductor device, electric power conversion apparatus and method for manufacturing semiconductor device202111,062,922Substrate liquid processing apparatus202110,861,944Semiconductor device and method for manufacturing the same202010,707,310Semiconductor device202010,707,357Semiconductor device202010,707,339Semiconductor device202010,186,588Semiconductor substrate and semiconductor device201910,008,571Semiconductor wafer, semiconductor device, and method for manufacturing nitride semiconductor layer20189,679,974'Nitride semiconductor element, nitride semiconductor wafer, and method for forming nitride semiconductor layer'20179,673,284'Nitride semiconductor device, nitride semiconductor wafer, and method for forming nitride semiconductor layer'2017D0781513'Vacuum cleaner'20179,508,804'Nitride semiconductor element and nitride semiconductor wafer'2016D0766524'Vacuum cleaner'2016D0764734'Steam iron'20169,397,167'Nitride semiconductor wafer, nitride semiconductor device, and method for manufacturing nitride semiconductor wafer'20169,391,145'Nitride semiconductor element and nitride semiconductor wafer'20169,349,590'Method for manufacturing nitride semiconductor layer'20169,331,234'Semiconductor light emitting device and method for manufacturing semiconductor light emitting device'20169,305,773'Semiconductor device, nitride semiconductor wafer, and method for forming nitride semiconductor layer'20169,287,369'Nitride semiconductor element and nitride semiconductor wafer'20169,202,873'Semiconductor wafer for semiconductor device having a multilayer'20159,130,069'Method for manufacturing nitride semiconductor layer and method for manufacturing semiconductor light emitting device'20159,130,098'Semiconductor light emitting device'20159,123,831'Semiconductor device, nitride semiconductor wafer, and method for forming nitride semiconductor layer'20159,112,111'Semiconductor light emitting device and method for manufacturing semiconductor light emitting device'20159,065,003'Semiconductor light emitting device and semiconductor wafer'20159,065,004'Semiconductor light emitting element'20159,054,036'Nitride semiconductor device, nitride semiconductor wafer, and method for forming nitride semiconductor layer'20159,053,931'Nitride semiconductor wafer, nitride semiconductor device, and method for manufacturing nitride semiconductor wafer'20158,897,862'Fetal cardiac potential signal extraction program, fetal cardiac potential signal discriminating apparatus, and pregnancy monitoring system using the same'20148,872,158'Semiconductor light emitting device'20148,785,943'Nitride semiconductor device, nitride semiconductor wafer, and method for manufacturing nitride semiconductor layer'20148,772,800'Semiconductor light-emitting device'20148,698,123'Semiconductor light emitting device'20148,680,537'Nitride semiconductor element and nitride semiconductor wafer'20148,604,496'Optical semiconductor device'20138,598,605'Semiconductor light-emitting device'20138,564,006'Nitride semiconductor device and nitride semiconductor layer growth substrate'20138,348,281'Seal ring and stern tube sealing device'20138,242,678'Automotive discharge lamp'2012D0638523'Seal ring for stern tube'2011D0638522'Seal ring for stern tube'2011D0631948'Seal ring for stern tube'20117,524,476'Vacuum ultraviolet excited green phosphor material and light-emitting device using the same'2009D0581110'Electric vacuum cleaner body'2008D0573759'Electric vacuum cleaner'2008D0570563'Vacuum cleaner'2008D0570567'Vacuum cleaner'20087,375,459'Vacuum ultraviolet excited green phosphor material and light-emitting device using the same'20087,282,850'Vacuum ultraviolet-excited ultraviolet phosphor and light-emitting device that uses this phosphor'20077,241,306'Narrow-band UV-B phototherapeutic device'20077,176,500'Red fluorescent material, white light emitting diode using red fluorescent material, and lighting system using white light emitting diode'20077,139,049'Color filter forming region of first side entirely corresponds to color filter non-forming region of second side, and color filter non-forming region of first side entirely corresponds to color filter forming region of second side'20066,897,923'Reflective-type liquid crystal display device including resin layer with fine particles'20056,774,382'Fluorescent transilluminator requiring no visible light-cutting filter'20046,762,559'High-pressure mercury discharge lamp and lighting apparatus using the lamp'20046,749,118'Automatic ticket gate apparatus'20046,731,057'Phosphors for fluorescent lamps'20046,556,126'Wireless recording medium, gate system & transactions system'20036,481,720'Stern tube sealing apparatus'20026,229,598'Electro-optic distance measuring apparatus'20016,226,076'Distance measuring apparatus using pulse light'20016,190,104'Treatment object conveyor apparatus, semiconductor manufacturing apparatus, and treatment object treatment method'20016,143,083'Substrate transferring mechanism'20006,133,992'Distance measurement apparatus'20006,066,210'Substrate processing apparatus with a processing chamber, transfer chamber, intermediate holding chamber, and an atmospheric pressure section'20005,838,411'Liquid crystal display device with unequal sized dummy sub-electrodes having a specific relationship'19985,788,447'Substrate processing apparatus'19985,759,797'Apparatus and method for analyzing physiological state of organism'1998D0382766'Pot for rice cooker'19975,078,256'Machine tool having a chip collecting apparatus'19925,006,685'Machine tool with grinding function and truing/dressing method of grinding stone using it'19914,762,263'Small-sized gas pressure welding machine for rails with two separate mechanisms for punching-shearing excess metal'1988Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1998–2021Based in Tokyo, JP· patent location history
2002–2013Based in Toyama, JP· patent location history
2003–2020Patents assigned to TOSHIBA KK (33)· patent assignee history
2003–2018Based in Kanagawa, JP· patent location history
2007–2009Based in Shinagawa-ku, JP· patent location history
2012–2016Patents assigned to YOSHIDA HISASHI (13)· patent assignee history
2013–2016Patents assigned to NUNOUE SHINYA (11)· patent assignee history
2013–2016Patents assigned to SUGIYAMA NAOHARU (10)· patent assignee history
2013–2016Patents assigned to HIKOSAKA TOSHIKI (7)· patent assignee history
2019–2020Based in Kawasaki, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| TOSHIBA KK | 33 | 2003–2020 |
| YOSHIDA HISASHIself | 13 | 2012–2016 |
| NUNOUE SHINYA | 11 | 2013–2016 |
| SUGIYAMA NAOHARU | 10 | 2013–2016 |
| HIKOSAKA TOSHIKI | 7 | 2013–2016 |
Locations
| Location | Patents | Span |
|---|---|---|
| Kanagawa, JP | 21 | 2003–2018 |
| Tokyo, JP | 17 | 1998–2021 |
| Kawasaki, JP | 5 | 2019–2020 |
| Toyama, JP | 5 | 2002–2013 |
| Shinagawa-ku, JP | 4 | 2007–2009 |