Inventor
Anthony L. Chen
Inventor
Pleasanton, CA, US
Overview
Patents· 13 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H01Jprimary
H01JElectric discharge tubes or discharge lamps29%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1021%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices12%
C23CCoating metallic material9%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests9%
C03CChemical composition of glasses, glazes or vitreous enamels6%
C23FNon-mechanical removal of metallic material from surface6%
B44CProducing decorative effects3%
G06QInformation and communication technology [ict] specially adapted for administrative, commercial, financial, managerial or supervisory purposes3%
H04LTransmission of digital information, e.g. telegraphic communication3%
PatentTitleYear
11,080,652Method and system for supply chain management20218,859,432'Bare aluminum baffles for resist stripping chambers'20148,313,635'Bare aluminum baffles for resist stripping chambers'20127,811,409'Bare aluminum baffles for resist stripping chambers'20107,578,945'Method and apparatus for tuning a set of plasma processing steps'20097,138,067'Methods and apparatus for tuning a set of plasma processing steps'20067,097,744'Method and apparatus for controlling darkspace gap in a chamber'20066,777,173'H2O vapor as a processing gas for crust, resist, and residue removal for post ion implant resist strip'20046,770,214'Method of reducing aluminum fluoride deposits in plasma etch reactor'20046,711,621'System and method of implementing netware core protocol within a sockets model'20046,344,151'Gas purge protection of sensors and windows in a gas phase processing reactor'20026,074,516'High sputter, etch resistant window for plasma processing chambers'20006,071,375'Gas purge protection of sensors and windows in a gas phase processing reactor'2000Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2000–2014Patents assigned to LAM RES CORP (10)· patent assignee history
2000–2004Based in Oakland, CA, US· patent location history
2004–2014Based in Pleasanton, CA, US· patent location history
2004Based in Roseville, CA, US· patent location history
2006Patents assigned to APPLIED MATERIALS INC (1)· patent assignee history
2006Based in Los Altos Hills, CA, US· patent location history
2012Patents assigned to CHEN ANTHONY L (1)· patent assignee history
2012Patents assigned to EGLEY FRED D (1)· patent assignee history
2021Patents assigned to FLEXPORT INC (1)· patent assignee history
2021Based in San Francisco, CA, US· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| LAM RES CORP | 10 | 2000–2014 |
| APPLIED MATERIALS INC | 1 | 2006 |
| CHEN ANTHONY Lself | 1 | 2012 |
| EGLEY FRED D | 1 | 2012 |
| FLEXPORT INC | 1 | 2021 |
Locations
| Location | Patents | Span |
|---|---|---|
| Pleasanton, California, US | 6 | 2004–2014 |
| Oakland, California, US | 4 | 2000–2004 |
| San Francisco, California, US | 1 | 2021 |
| Los Altos Hills, California, US | 1 | 2006 |
| Roseville, California, US | 1 | 2004 |