Inventor

Yuan He

Inventor
Boise, ID, US

Overview

6→
Patents
2018–2021
Patent span
Physics
Primary field (CPC G)

Patents· 6 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G11Cprimary
G11CStatic stores19%
B01JChemical or physical processes, e.g. catalysis or colloid chemistry6%
C01GCompounds containing metals not covered by subclasses c01d or c01f6%
C01PIndexing scheme relating to structural and physical aspects of solid inorganic compounds6%
C09CTreatment of inorganic materials, other than fibrous fillers, to enhance their pigmenting or filling properties6%
F16MFrames, casings or beds of engines, machines or apparatus, not specific to engines, machines or apparatus provided for elsewhere6%
G06FElectric digital data processing6%
G09FDisplaying6%
H01GCapacitors6%
H01LSemiconductor devices6%

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2018Patents assigned to UNIV NORTH CHINA ELECTRIC POWER (1)· patent assignee history
2018Based in Beijing, CN· patent location history
2021Patents assigned to MICRON TECHNOLOGY INC (4)· patent assignee history
2021Patents assigned to C/O MICRON TECH INC (1)· patent assignee history
2021Patents assigned to SHANGHAI TIANMA AM OLED CO LTD (1)· patent assignee history
2021Based in Boise, ID, US· patent location history
2021Based in Tokyo, JP· patent location history
2021Based in Hachioji, JP· patent location history
2021Based in Shanghai, CN· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
MICRON TECHNOLOGY INC42021
C/O MICRON TECH INC12021
SHANGHAI TIANMA AM OLED CO LTD12021
UNIV NORTH CHINA ELECTRIC POWER12018
Locations
LocationPatentsSpan
Boise, ID, US22021
Tokyo, JP12021
Hachioji, JP12021
Shanghai, CN12021
Beijing, CN12018