Inventor
Risa Yamakoshi
Inventor
Toyama, JP
Overview
Patents· 6 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
C23Cprimary
C23CCoating metallic material30%
H01LSemiconductor devices30%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1030%
H10DInorganic electric semiconductor devices5%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h105%
PatentTitleYear
11,041,240Substrate processing apparatus, method of manufacturing semiconductor device, and recording medium202110,607,833Method of manufacturing semiconductor device, substrate processing apparatus, and recording medium202010,513,775Method of manufacturing semiconductor device, substrate processing apparatus, and recording medium201910,081,868Gas supply nozzle, substrate processing apparatus, and non-transitory computer-readable recording medium20189,934,960Method of manufacturing semiconductor device20189,905,413'Method of manufacturing semiconductor device'2018Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2018–2021Patents assigned to HITACHI INT ELECTRIC INC (6)· patent assignee history
2018–2021Based in Toyama, JP· patent location history
2019–2020Patents assigned to KOKUSAI ELECTRIC CORP (2)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| HITACHI INT ELECTRIC INC | 6 | 2018–2021 |
| KOKUSAI ELECTRIC CORP | 2 | 2019–2020 |
Locations
| Location | Patents | Span |
|---|---|---|
| Toyama, JP | 6 | 2018–2021 |