Inventor
PRASHANTH KOTHNUR
Inventor
US
Overview
Patents· 21 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
C23Cprimary
C23CCoating metallic material27%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1020%
H01JElectric discharge tubes or discharge lamps16%
H01LSemiconductor devices10%
G05BControl or regulating systems in general6%
G06FElectric digital data processing4%
H10FInorganic semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation4%
H10KOrganic electric solid-state devices4%
LOC234%
B05BSpraying apparatus2%
PatentTitleYear
12,518,069Comprehensive modeling platform for manufacturing equipment202612,473,639Methods for forming films on substrates202512,443,175Eco-efficiency (sustainability) dashboard for semiconductor manufacturing202512,438,011Apparatus and method for controlling a flow process material to a deposition chamber202512,325,909EM source for enhanced plasma control202512,203,163Methods for shaping magnetic fields during semiconductor processing202512,131,105Virtual measurement of conditions proximate to a substrate with physics-informed compressed sensing202412,043,895Methods of using a segmented showerhead for uniform delivery of multiple pre-cursors202412,001,197Eco-efficiency (sustainability) dashboard for semiconductor manufacturing202411,970,775Showerhead for providing multiple materials to a process chamber202411,834,743Segmented showerhead for uniform delivery of multiple precursors202311,692,262EM source for enhanced plasma control202311,655,534Apparatus for reducing tungsten resistivity202311,600,476Deposition system with multi-cathode and method of manufacture thereof202311,505,863Methods for forming films on substrates2022D0969980Deposition chamber showerhead202211,495,440Plasma density control on substrate edge2022D0967351Showerhead reflector202211,447,857Methods and apparatus for reducing tungsten resistivity202211,393,703Apparatus and method for controlling a flow process material to a deposition chamber202211,183,375Deposition system with multi-cathode and method of manufacture thereof2021Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2021–2026Patents assigned to APPLIED MATERIALS INC (21)· patent assignee history
2021–2026Based in US· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| APPLIED MATERIALS INC | 21 | 2021–2026 |
Locations
| Location | Patents | Span |
|---|---|---|
| US | 21 | 2021–2026 |