Inventor
Bert Jan Kampherbeek
Inventor
Delft, NL
Overview
Patents· 9 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
B82Yprimary
B82YSpecific uses or applications of nanostructures47%
H01JElectric discharge tubes or discharge lamps47%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices5%
PatentTitleYear
9,105,439'Projection lens arrangement'20158,890,094'Projection lens arrangement'2014RE045049'Electron beam exposure system'2014RE044908'Electron beam exposure system'2014RE044240'Electron beam exposure system'20138,089,056'Projection lens arrangement'20127,091,504'Electron beam exposure system'20066,897,458'Electron beam exposure system'20056,844,560'Lithography system comprising a converter plate and means for protecting the converter plate'2005Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2005–2015Patents assigned to MAPPER LITHOGRAPHY IP BV (9)· patent assignee history
2005–2015Based in Delft, NL· patent location history
2012–2015Patents assigned to KAMPHERBEEK BERT JAN (5)· patent assignee history
2012–2015Patents assigned to KRUIT PIETER (5)· patent assignee history
2013–2014Patents assigned to VAN VEEN ALEXANDER HENDRIK VINCENT (3)· patent assignee history
2013–2014Patents assigned to WIELAND MARCO JAN-JACO (3)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| MAPPER LITHOGRAPHY IP BV | 9 | 2005–2015 |
| KAMPHERBEEK BERT JANself | 5 | 2012–2015 |
| KRUIT PIETER | 5 | 2012–2015 |
| VAN VEEN ALEXANDER HENDRIK VINCENT | 3 | 2013–2014 |
| WIELAND MARCO JAN-JACO | 3 | 2013–2014 |
Locations
| Location | Patents | Span |
|---|---|---|
| Delft, NL | 9 | 2005–2015 |